ICMCTF1999 Monday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Monday, April 12, 1999 | ||||
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10:30 AM | 11:30 AM | ||||
A2 |
High Temperature Particulate Erosion of Plasma Sprayed YSZ vs. Selected Powder Characteristics and Plasma Torch Designs
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Quantification of the Strength Modification of Thin Films at Elevated Temperatures
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Study of Micron Scale Thermal Properties of Layered Samples by Inversion of Photothermal Measurements: Application to Gun Tubes Inner Coatings
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X-ray Analysis of Magnetron Sputtered Tantalum Coatings Vs Electro-chemical Deposited Tantalum in Molten Salt
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B4 |
Approaches to Rid Cathodic Arc Plasmas from Macro- and Nanoparticles
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Filtered Laser-Arc: A New Technology for Deposition of Particelfree Films
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Design of Nanostructured B-C-N Films for Tribological Applications
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Dynamic of a Pulsed DC Glow-Discharge Used for Plasma-CVD
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C5 |
Polymeric Film Deposition by Ionization-Assisted Method for Optic and Optoelectronic Applications
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Modelling the Functional Performance of Plasmapolymerised Thin Films
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Computational Investigations of Strongly Adhering Polymer Thin Films
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Experiences with Pulsed Magnetron Sputtering (PMS) for Coating on Plastics
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E3 |
Graded Bioactive Coatings on Ti Implants
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Infection Resistant Biomimetic Coatings for Orthopedic Implants
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Tribological Properties of Coatings for Hip Joint Prostheses
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Effect of Carbon Overcoat Film Coverage on Corrosion Protection of Magnetic Thin Film Disks.
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F3 |
Quantitative and Non-Destructive Materials Characterization Using Ion Beams: Applications to Thin Films
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Characterization Of SiOxNy Antireflective Coatings Using SIMS And RBS
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The Effect of PVD-Coating-Constitution on Surface Free Energy
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XPS Analyses of TiN Films on Cu Substrates after Annealing in the Controlled Atmosphere
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G5 |
Challenges and Opportunities for Surface Engineering with Thin Film Processes
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Advanced Complex Coating Systems for Cutting Applications
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Microwave PECVD Source for Deposition Up to 1 Bar Pressure
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H1 |
Atomic Layer by Layer Growth of Complex Oxide Heterostructures
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Elucidation of the Reaction Sequences of Binary and Ternary Systems of CIGS
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Producing Thin Films Using Low Pressure Plama Spray
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A Novel Pulsed Magnetron Sputter Source Utilizing Very High Target Power Densities
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