ICMCTF1998 Friday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Friday, May 1, 1998 | |||||||||||||
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| 8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | 12:30 PM | ||||||||||
| B5 |
High IntensePulsed Ion-beam Sources and their Industrial Application
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Carbon, Nitrogen and Oxygen Implantation Into TiN Coatings
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Processing of Metals by Plasma Immersion Ion Implantation for Improved Mechanical Properties
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Formation of Hard Coatings for Tribological and Corrosion Protection by Dynamic Ion Mixing
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Deposition of Metal Nitrides by IBAD
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Non-Uniform SiO2 Membranes Produced by Ion Beam Assisted Chemical Vapor Deposition To Tune WO3 Gas Sensor Microarrays
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Intrinsic Stress in Ion Synthesized Materials
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Formation of Carbon Nitride Films by Means of Simultaneous Positive and Negative Ion Beam Deposition
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Optical Thin Film Coatings: Influence of Ion-Mass and Energy During the Ion-Beam-Assisted Deposition
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Structural Investigations of Chromium Nitride Films Formed by Ion Beam Assisted Deposition
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| F3-2 |
Hexagonal Ntride Coatings:Electronic and Mechanical Properties of V2N, Cr2N and MoN
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Surface- and Microanalytical Characterization of Silicon-Carbonitride Thin Films Prepared by Means of RF Magnetron Co-Sputtering
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Fundamental Characterization of Carbide and Nitride Coating Materials: Correlation of Surface Composition and Frictional Properties
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Corrosion of Titanium-nitride Encapsulated Silver Films Exposed to a Hydrogen-sulfide Ambient.
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Break
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Sputter Deposited Chromium Nitride Based Ternary Compounds for Hard Coatings
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Atomistic Simulations of the Generation of a New Kind of Hydrocarbon Thin Film Through Molecular Cluster-Solid Surface Collisions
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Change in Residual Stresses of TiN Films with Annealing Treatments.
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Effect of External Magnetic Field on c-Axis Orientation and Residual Stress in AlN Films
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| G8 |
The Status and Future of Diamond Thin Film FED
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Carbon Cathode Requirements and Emission Characterization for Low-voltage Field Emission Displays
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Electron Field Emission from Amorphous Carbon Thin Films
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Field Electron Emission from Ultrathin Diamond-Like Carbon Films Deposited Using an RF Inductively Coupled Plasma (ICP) Source
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Field Emission Spectroscopy on Carbon Thin Films
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Work Function of Transparent Conducting Multicomponent Oxide Thin Films Prepared by Magnetron Sputtering
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Application of High Temperature Deposited Aluminum Gate Electrode to the Fabrication of a-Si:H TFT
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