AVS 68 Friday Morning

Printable Electrochemical Biosensors based on 2D and 3D Graphene

A Large Area Selective Emitter for Thermophotovoltaic Applications

Advanced Two-Dimensional Nanohybrids for Efficient Electrocatalytic Hydrogen Evolution

Bandstructure Engineering in Two-Dimensional Semiconductors

Graphene – Ferritin Interface Unpins Fermi-Level and Induces Temperature Dependent Coherent Tunneling Across Biomolecular Junctions

The Influence of Selenium Incorporation on the HER Catalytic Activity of Electrodeposited Se-MoS_x Electrocatalysts

Two-Dimensional Skintronics

Ultrasonic-Assisted Assembly of Metal Nanoparticles within Graphene Oxide for Tailoring Stem Cell Response

AQS Workshop Opening Remarks

Electronic Excitations of Defects in Semiconductors – First-Principles Simulations and Quantum Embedding

Break

Running Quantum Circuits on a Neutral Atom Quantum Computer

Unitary Coupled Cluster Ansatz as an Efficient Way to Perform Electronic Structure Calculations

AQS Panel Discussion

AVS Quantum Workshop Closing Remarks

Piezoelectric Adjustable X-ray Optics

Oxide and Nitride Ferroelectric Wurtzite Crystals

Development and Processing of Al_1-xSc_xN (x<0.40) Films for Resonator and Filter Applications

Formation of Aluminum Scandium Nitride Microelectromechanical Systems Via Etching in Aqueous Potassium Hydroxide (KOH)

Interface Reactions During the Ferroelectric Switching of HfZrO Thin Films on InAs

The Effect of Hf Doping on Piezomagnetic Properties of FeCo for Magnetoelectric Heterostructure Devices

Two-Dimensional Steep-Slope Transistors Using Graphene Cold Sources

High Performance, RF Interposer Fabrication on Glass with 3 Metal Layers and Embedded TGVs

Single Step Fabrication Process of Alignment Markers for Direct-Write Electron Beam Lithography in Metal-Organic Negative Tone Resist

Non-Destructive Metrology Techniques for Characterizing a-C Hard Mask Films in 3D NAND Structures

Helium and Hydrogen Plasmas Interaction with Si-Based Materials for Advanced Etch Applications: Insights from MD Simulations

Efficient Parametric Nonlinear Model Reduction of Low Temperature Plasma Applications

Novel Approaches to Generate Missing Data for Plasma Chemistry Modeling

Particle-in-Cell Modeling of Electron-Beam Generated Low Electron Temperature Plasma

Modeling Edge Effects in Wafer Etching with VSim

A Study on Dielectric Material Etching in Cryogenic Process Based on Atomistic Simulation

Machine Learning Based Model for a RF Hollow Cathode Discharge

Molecular Dynamics Simulations of Plasma-Enhanced Atomic Layer Etching of Silicon Nitride Using Hydrofluorocarbon and Oxygen Plasmas

Understanding Plasma Etch Mechanism of Low-k Materials Under Low Temperature Substrates with Fluorine-Based Precursors

Plasma-Assisted Atomic Layer Etching of Silicon Nitride with Unfragmented Fluorocarbons

Time Resolved Ion Energy Distribution in Pulsed Inductively Coupled Argon Plasma with/without DC Bias

Optical and Electrical Diagnostics of Industrial Plasma Reactors: Measuring the Relevant Physical Quantities to Assist Process Development

Hole Transport Properties of Nickel Oxide Films Grown via Hollow-Cathode Plasma-Assisted Atomic Layer Deposition

In-Situ Measurement of Electron Emission Yield at Silicon Surfaces in Ar/CF4 Plasmas

Plasma Characterization: Radical Recombination Sensor Based on Dual Probe Thermopile Heat Flux Sensors

Dielectric Toroidal Plasma Sources for Improved Plasma Resistance

What We Still Won't Know About Plasmas in Simple Diatomic Gases- or Using a DC Glow Discharge in Pure O₂ as an Ideal Test-Bed for Experimental Validation of Models

Voltage and Sheath Dynamics in Electropositive Capacitively Coupled Plasmas with Focus Ring and External Circuit

Time Resolved Diagnostics of a Silver HiPIMS Discharge

Title: Curling Probe Analysis for Practical Measurement of Electron Density

Characterization of Materials and Surfaces with Various Types of Radiation

High-Energy (MeV), Heavy Ion Irradiation of Chalcogenide Phase Change Thin Films

Multiwavelength Raman Microscopy Used to Characterize Surfaces for Plasma-Wall Interaction Study in Tokamaks

In Situ Optical Characterization of High Temperature Defect Kinetics in Mixed-Conducting Oxide Films

Exploring the Effects of Radiation on Planetary Surfaces through the Analysis of Experimental Analogs and Returned Samples from the Moon and Asteroids

Ground-Based Space Environmental Testing of Materials and Components for Spacecraft Mission Assurance

New Challenges and Opportunities for Hard and Superhard Coatings

Operando Photoluminescence Microscopy Study of Photoreduction of Resazurin on Tio₂ Microcrystals

Unraveling Surface Structures of Ga-Promoted Transition Metal Catalysts in CO₂ Hydrogenation

Stabilization of Active Cu Sites on Oxide Surfaces

An optimized IRAS Setup to Investigate Adsorbates on Metal-Oxide Single Crystals

Photochemical Fluorination of TiO₂(110)

Surface Structures of La_0.8Sr_0.2MnO₃ (001) Thin Films

Adsorption of Organophosphate Nerve Agent VX on the (101) Surface of Anatase Titanium Dioxide

Combining Synchrotron X-ray and SFG Spectroscopy Techniques to Illuminate Aqueous Interfaces

X-Ray Studies of Extractant and Lanthanide Ion Ordering at Liquid Interfaces Relevant to Solvent Extraction

Probing Surface Chemistry in Complex Environments: Water Disinfectants and Ionic Solutions at the Air/Liquid/Iron Interface

The Surface Chemistry of Martian Mineral AnalogsDuring Triboelectric Charging in Sand Storms

Unraveling Water Formation on Planetary and Astrophysical Bodies: The Role of Surface Science

Growth of c-axis Textured AlN PVD Film on a 2D-MoS₂ Seed Layer

Synthesis and Hardness of Thin-Film High-Entropy Transition Metal Ceramics

Structural Evolution and Thermoelectric Properties of Flexible Mg₂Sn Films Prepared by Magnetron Co-sputtering

AlGaN‚ An Enabling Ultra-Wide Bandgap Semiconductor

CVD of Crystalline and Amorphous sp²-BN Thin Films on Different Orientations of Al₂O₃

Investigating SiC/Graphene/SiC(0001) Remote Epitaxy Using Hot-wall CVD

Sputter Deposition of III-N Thin Films

Thickness Dependent Properties of Ferroelectric Boron-Substituted Aluminum Nitride Thin Films