AVS2004 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, November 16, 2004
8:20 AM 9:20 AM 10:20 AM 11:20 AM
AS-TuM
Light Induced Chemically Resolved Electrical Measurements (LICREM) in XPS: Anomalous Photoresponse of CdSe Nanoparticle Films
Validation of Information Gained from the XPS Survey Scan
Extensions of Photoelectron Spectroscopy to the Study of Nanoscale Systems
XPS Chemical Depth Profiling Using C60 Ion Beams
X-Ray Photoelectron Spectroscopy of Rubber Compounds: Temperature Dependence and Crosslink Distribution
Monte Carlo Simulations of Electron Backscattering from Surfaces in Scanning Auger Microscopy
Round Robin Study of Evaluation of Electron Beam Damage of SiO2/Si in Auger Microprobe Analysis
Performance of a High throughput TOF-HREELS Analyzer
Oxygen Environmental Electron Spectroscopy and Microscopy: A New Concept for Reducing Harmful Electron Beam Effects on Insulating Samples
BI+
Programmed Macromolecular Synthesis
The Art of Mechano-Transduction within the Extracellular Matrix
Capture and Release of Proteins on the Nanoscale by Surface-Confined Biomolecular Switches
Micro- and Nanopatterns of DNA-Tagged Vesicles
Label-Free Biosensor Based on the Surface Plasmon Resonance of Gold Nanoparticles
Activation of Integrin Function by Nanopatterned Adhesive Interfaces
Lifetime of Biomolecules in Hybrid Nanodevices: The Aging Process of Motor Protein-based Molecular Shuttles
Analysis of Collision Events of Self-Propelled Biomolecular Shuttles Carrying Cargo
DI+
Inductively Coupled Remote Nitrogen Plasma Treatment of Hf Based Gate Dielectrics for Improved Interface Stability on Si(100)
In Situ Infrared Spectroscopy of High-k Dielectric Growth on Si (100)
DFT Study of the Initial ALD Reactions of Hf(N(CH3)2)4 on the SiO2 and Si-H Surfaces: Mechanism, Kinetics, Vibrational Spectra and Interface Structure
Development of Post Etching Process for Hf Based High-K Gate Dielectric
Plasma-Enhanced Atomic Layer Deposition for Compositionally Controlled Metal Oxide Thin Films
DFT Investigation of Initial HfO2 Atomic Layer Deposition on Nitrided Silicon Surface
Oxygen Transport Properties in Hafnium Silicate Films
Investigation of the Roles of Oxygen Plasma and Solvent in the Pulsed-Liquid Injection PE-MOCVD Deposition of Y2O3 High-κ Materials in MIM Structures
UV Activated Surface Preparation of Silicon for High-k Dielectric Deposition
Annealing of Hafnium Oxide Grown on Silicon by Atomic Layer Deposition: Changes in Interfacial Structure
EM-TuM
Near-Surface Defects and Schottky Barrier Formation at Au/ZnO(000-1) Interfaces
Investigation of the Sources of Variations in the Electrical Characteristics of Ohmic and Rectifying Contacts
Simultaneous Formation of p- and n-type Ohmic Contacts to 4H-SiC using Ni/Ti/Al Contact Materials
Fabrication, Processing and Specific Contact Resistance Measurements of Contacts to Semiconductor Nanowires
CMOS Metal Gate Implementation
Physical and Electrical Properties of MoX NY and MoX SiY NZ as Gate Electrode Materials for MOS Devices.
Influence of Interactions Between Ta-N Films and Low Dielectric Constant Materials on the Stability of Copper Interconnection
Low Resistivity Germanides
MI-TuM
Semiconductor Spintronics: From Basic Physics towards Spin Devices
Characterization of Thin Film MnGa/GaAs(001) Heterostructures
Co2MnGe/Ga1-xAlxAs Heterostructures: Growth, Characterization and Spin Injection
Determination of the Influence of the Interfacial Formation and the Semiconductor Doping Profiles on the Spin Injection from FexCo1-x Contacts into GaxAl1-xAs
Growth and Magnetic Properties of Group-IV Dilute Magnetic Semiconductors
Universal Scaling of Magnetoconductance in Magnetic Nanoconstrictions*
Spin-Transfer Torque in a Single Ferromagnetic Layer
Magneto-Resistance in Epitaxial Nano-Contacts for Spintronic Device Applications
MN-TuM
C-MEMS/NEMS: A Novel Technology for Graphite, Ni, and Si Nanoscale Material Formation
Durability Studies of MEMS/NEMS Materials/Coatings at High Sliding Velocities (upto 10 mm/s) Using a Modified AFM
Chemical Control of Micromechanical Resonators: The Role of Surface Chemistry
Tribological and Wear Studies of ALD and SILAR Coatings for MEMS Devices
MEMS-based Force-Detected Nuclear Magnetic Resonance Spectrometer
Frequency-Tuning for Control of Parametrically-Resonant Mass Sensors
Field Emission from a Tungsten MEMS Structure
Suspended Waveguide-Based Tunable Integrated Optical Filters on Indium Phosphide MEMS Platform
Use of Plasma Polymerisation Process for Fabrication of Micro Electromechanical System (MEMS) for Micro-Fluidic Devices
NS-TuM
Controlled Fabrication and Modification of Organized Carbon Nanotube Architectures
Growth of Arrays of mm Long, Straight Single-Walled Carbon Nanotubes
Low-temperature Synthesis of Aligned Carbon Nanotubes by Hot-Filament Assisted DC Plasma CVD
Theoretical Study of Catalytic Growth Single-Walled Carbon Nanotubes
Controlling and Modeling the Interphase in Polymeric Nanocomposites
Wetting of Individual Carbon Nanotubes with Organic Liquids
Impregnation of Osmium Dioxide to MWCNTs and Improvement of the Electron Emission Characteristics
Electron Emission Property from MWCNTs with Subnano Ruthenium Dioxide Clusters and with High Adhesivity on Substrate - High Current Endurance Test in UHV and Influence of H2O or CO -
Synthesis of Y-Junction Singlewall Carbon Nanotubes
Surface-Programmed Assembly Process of Large-Size Multi-Wall Carbon Nanotubes and Its Mechanism
PS1-TuM
Polymer Formation in Fluorocarbon Etch Plasmas
Reduction of Line Edge Roughness for 90nm Technology Node for Contact and Trench Etched Features
Effect of Non-sinusoidal Bias Voltage Waveforms on Ion Energy Distributions and SiO2/Si Etch Selectivity in Fluorocarbon Plasmas1
Dielectric Processes Enhancements Using Multifrequency Sheath Modulation
A Novel Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma for Fabrication of Micro-Optical Devices
Surface Kinetics Modeling for Silicon Oxide and OSG Etching in Fluorocarbon Plasmas
Study on Self-aligned Contact Oxide Etching Using C5F8/O2/Ar and C5F8/O2/Ar/CH2F2 Plasma
Advanced Inductive Plasma Etcher for Low-k Materials and Oxide
Impact of Vibrational States on Dissociation in Fluorocarbon and Hydrogenated Fluorocarbon Plasmas
Measuring Macro- and Micro-loading Impact on Etch Bias
PS2-TuM
Study of Refractory Metal Nitrides/HfO2 Gate Stack Etching Using Inductively Coupled Plasma
Line Width Roughness Reduction for Advanced Metal Gate Etch and STI Etch with 193nm Lithography in a Silicon Decoupled Plasma Source Etcher (DPSII)
Plasma Etching of Metal/High-K Gate Stack
Etching Ruthenium with O2- and Cl2-Containing Inductively Coupled Plasma
Ru Etching Characteristics in Capacitively Coupled Ar/Cl2/O2 Plasma
An Isotropic SiGe Etch Process for Fabrication of Silicon-on-Nothing Transistors
X-ray Photoelectron Spectroscopy Study on Walls Coatings and Passivation Layers Generated on Sidewalls Trenches during Shallow Trench Isolation Processes.
The Control of Electrode Impedance, Gas-Injection and Wafer-Temperature Radial Profile and their Effects on Poly-Gate Etching Performance
Process Diagnostics and Optimization in Plasma Etch Chambers Using In-Situ Temperature Metrology
New Mthod to Analyse Chamber Walls Coating during Plasma Etch Processes
SE-TuM
Tribological Coatings: Synthesis, Structure, and Properties
New Concepts for Low-friction Coatings
Why do DLC and MoSx-based Amorphous Coatings Have Similar Friction and Wear Behavior?
In-situ Quantitative Nano-scale Metrology of Thin Coatings
Effect of Impurities and Deposition Condition on the Mechanical Properties of Superhard Nanocomposites with High Thermal Stability
Development of Hybrid Deposition Techniques for Nanocomposite Coating Growth
Growth and Characterization of Zirconium Nitride/Inconel Nanocomposite Structures
Microstructure and Properties of Ti-Al-Si-N Coatings Prepared by r.f.-Reactive Sputtering in Facing Targets-type Sputtering (FTS) System
SS1-TuM
Surface Reactions and Catalysis
The CO-oxidation Reaction on Pt(111) and Pt(553): The Role of Steps
Controlling the Catalytic Reactivity and Selectivity of Ni Surfaces by Step Blocking
High Pressure Scanning Tunneling Microscopy Study on CO Poisoning of Ethylene Hydrogenation on Metal Single Crystals
Iridium (210): Nanoscale Faceting and Structure-sensitivity of Surface Reactions
Kinetics of Co Oxidation Catalyzed by Supported Iridium Particles in a Wide Pressure Range
High Pressure Methane Activation on Platinum Single Crystal Surfaces
Nanoporous Pd Films Grown Via Ballistic Deposition: Structural And Catalytic Properties
Novel NO Adsorption States on Pd (111) at Elevated Pressures: Irreversibility of the Effects of Temperature and Pressure on Heterogeneous Catalytic Systems
SS2-TuM
Vapor-Phase Adsorption Kinetics of 1-Decene on Hydrogenated Si(111)
Molecular Monolayers on Single-Crystal and Nanocrystalline Diamond Surfaces
High Resolution Mapping of Compositional Differences and Reactions at Buried Interfaces by Electric Force Microscopy
Chemical Engineering of GaAs Surfaces with Aromatic Self-Assembled Monolayers
Self Assembled Monolayers of Arenethiol Molecules on Cu(111)
Fabricating Self-Assembled Monolayers of Selenolates on Noble Metal Substrates
Interface Electronic Structure of Thiol Terminated Molecules on Metals
Designing Self-assembled Monolayers (SAM) of Thiols: A Study on Lattice Mismatch
Sulfur-induced Nano-restructuring of the Au(111) Surface: A Real-time STM Study
Comparative UHV-STM Study of Adsorption Structures Formed from a Family of Oligo(phenylene ethynylene)s on Au(111)
TF1-TuM
Mechanisms of Vapor Permeation Through Multilayer Thin-Films
Multi-layered ITO and SiO2 Thin Films Deposited on Plastic Substrates by Vacuum Arc Plasma Evaporation
Mechanical Performance of Thin Films in Flexible Displays
Structural and Mechanical Properties of Dendrimer-mediated Thin Films
Gas Diffusion Barriers on Polymer Films Using Al2O3 Atomic Layer Deposition
TF2-TuM
Atomic Layer Deposition of Tungsten Disulphide Solid Lubricant Coatings
Molybdenum Atomic Layer Deposition Using MoF6 and Si2H6
Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials
High Reflectivity X-Ray Mirrors from W/Al2O3 Nanolaminates Fabricated by Atomic Layer Deposition
Atomic Layer Deposition of Nickel Oxide Films Using Ni(dmamp)2 and Water
Sessions | Time Periods | Topics | Schedule Overview