AVS2003 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, November 3, 2003
2:00 PM 3:00 PM 4:00 PM 5:00 PM
AP-MoA
Nanotechnology: A Policy Perspective
Nanotechnology: Future Challenges and Opportunities
Self-Assembly Processing for Nanomanufacturing
Nanotechnology: Constructing a Computer from Molecular Components
Massively Parallel Assembly
AS-MoA
Vibrational Behavior of Adsorbed CO2 on the Interior and Exterior Surfaces of Carbon Nanotubes: An Experimental and First Principles Study
Adsorption and Dimerization of NO Inside of Single Walled Carbon Nanotubes - An Infrared Spectroscopic Study
Adsorption of CF4 on Opened Single Walled Carbon Nanotubes
Sidewall Chemistry of Carbon Nanotubes Investigated by STM
Iron-Oxide Nanoparticle Stability in an Ion Beam
Scanning Tunneling Spectroscopy of Boron Nitride Nanotubes; Evidence for a Giant Stark Effect
Size Dependency of Structural, Optical, and Photocatalytical Properties of TiO2 Nanoparticles
Determination of the Fermi Level of Isolated Single-Walled Carbon Nanotubes in Solution
Band Modulation in Various Nanopeapods and Its Origin
BI-MoA
Towards the Prevention of Protein Adsorption, and Bacterial and Cell Adhesion by Optimised Surface Modification
Factors that Determine the Protein Resistance of Oligoether Self-assembled Monolayers - Internal Hydrophilicity, Terminal Hydrophilicity and Lateral Packing Density
Use of QCM-D to Analyze Thin Polymer Films at Interfaces
Non-Fouling Surfaces: Their Use and Study by Matrix-Assisted Laser Desorption / Ionization Mass Spectrometry
Comparison of Immunoassay Blocking Strategies on Metal Oxide Substrates
Lubricating with Water: Biomimetic Additives
Boundary Lubrication Properties of Bio- and Synthetic Polymers Containing Poly- and Oligosaccharides
The Role of Polysaccharides in Bacterial Adsorption: A Chemical Perspective
DI-MoA
Etching and Thermal Stability of Zirconium and Hafnium Oxide High-k Dielectrics
Structure and Stability of Alternative High-K Gate Dielectrics
Hafnium Silicate High-K Dielectric Etch with High Selectivity to Si at Low Wafer Temperatures
Post Deposition Stability of High-k Dielectrics to Air Exposure and its Implications to Interface Reactivity
Growth, Characterization and Thermal Stability of High-K Gate Stacks
Hafnium Germanosilicate Thin Films for Gate and Capacitor Dielectric Applications: Thermal Stability Studies
EM+
Localized Defect States, Impurities, and Doping in AlxGa1-xN Epilayers
Contactless Characterization of High Electron Mobility Transistor Structures using Surface Photovoltage Spectroscopy
Atomic Bonding and Electronic Changes at InGaAs/InP Heterojunctions
Nanoscale Electronic Characterization of Semiconductors: from Operating Devices to Atomic Scale Defects
STM Observation of Subsurface Boron Dopants on the Si(001)-2x1 Clean Surface
Surface Defects After the Growth of Highly P and Sb Doped Si
The Effect of Strain on Impurity States in Si and Methods of Calculation Thereof
New Mechanism for Coupling between Properties of Interfaces and Bulk Semiconductors
MI-MoA
Materials/Structures for High Areal Density Write Poles
Influence of Pd and Pt Buffers on the Soft Magnetic Properties of Fe70Co30 Thin Films
Atomistic Simulations of Metal/Metal Oxide Heterostructures
Quantum-size Effect of Tunneling Magnetoresistance in Magnetic Tunnel Junctions
Magnetization Dynamics and Magneto-transport in Epitaxial Nano-structures
Artifacts in Ballistic Magnetoresistance Measurements
Arrays of Magnetoresistive Sensors for Non-destructive Testing
MS-MoA
Research and Challenges in Nano Mechanics and Materials
Opportunities and Challenges in the Materials Supply Chain for Semiconductor Manufacturing
New Processes and Materials for Environmentally Benign Semiconductor Manufacturing
Sub-100 nm Copper Wiring Challenges and Solutions
Nanoporous Organosilicates for On-Chip Applications Using Sacrificial Macromolecular Porogens
OM-MoA
Characterization of Organic-Metal and Organic-Organic Interfaces
The Role of Charge Neutrality Level in Molecular Level Alignment at All-organic Heterojunctions
Au/CuPc Interface: A Photoemission Investigation
XPS and HRSEM Studies on the Interfaces of Au/CuPc vs. Au/FCuPc
A Combined Photoemission Spectroscopy and Scanning Probe Microscopy Study of Organic Charge Injection Layer / Metal Interfaces
Electronic Structures of Al/Liq/Alq3 Interfaces Studied by Photoemission Spectroscopy
Direct Observation of the Evolution of the Molecular Orbital Energy Levels of a Silole Derivative as a Function of Magnesium Deposition
Band Alignment on Patterned Surfaces
A General Soft Contact Evaporation Method for Molecule-Based (Opto) Electronic Devices
PS-MoA
Ion-Acoustic Solitons in a High Power Pulsed Magnetron Sputtering Discharge
Next Generation RF Ion Beam Source for Three-Dimensional and other Critical Etching Applications
The Use of Reactive Gases with Broad-beam RF Ion Sources for Industrial Applications
Reactive Sputter Deposition of Nanocrystalline Compound Thin Films with a Hollow Cathode Source Operated in a Static Mode
Evolution of Radiofrequency Plasma Sources
Physics of High-pressure Helium and Argon Plasmas
Two-dimensional Self-consistent Modeling of Wave Propagation and Plasma Dynamics in a Helicon Source
Large Area Electron-Beam Generated Plasma Processing System1
Post-etch Wafer Cleaning by a New Dry-cleaning Technique using Both Gas Flow and Plasma
PS+
Understanding Deep Silicon Etching: Mechanisms for Formation and Removal of Sidewall Passivation
Improvement of Anisotropy and Aspect Ratio of a Pattern Etched in Bosch Process by using a Faraday Cage
Exploring Microdischarges for Manufacturing and Sensing Applications
Feature Scale Model of Etching High Aspect Ratio Structures in Silicon using SF6/O2 Plasma
Etching of High Aspect Ratio Structures in Si using SF6/O2 Plasmas
Via Drilling on Silicon Wafers using the Cryogenic Process
Si, SiO2 Feature Etching for MEMS Fabrication: A Combined Simulator Coupling Local Transport, Surface Etch, and Profile Evolution Models
In-Situ On-wafer Monitoring for Charge Build-up Voltage during Plasma Process
Plasma Etching of Chromium as a Hard Mask for a Complex Metal Stack Etch
QS-MoA
Metrology Needs for Ultrathin Films in the Wafer Processing Industry. What is Needed? What is Available?
Intercomparison of Silicon Dioxide Thickness Measurements Made by Multiple Techniques - The Route to Accuracy
Comparative Thickness Measurements of SiO2/Si Films for Thicknesses less than 10 nm
The Thickness and Composition of Ultra-thin SiO2 Layers on Si
Characterization and Metrology for High k Materials using Parallel Angular Resolved XPS (PARXPS)
Multivariate Statistical Analysis of Spatially Compressed Time-of-Flight Secondary Ion Mass Spectrometry Images1
SE-MoA
High-resolution TEM Study the Microstructure of W-Si-C Films in the Vicinity of the Crystalline-Amorphous Transition
Metrology of 1-10 nm Thick CNx Films: Thickness, Density and Surface Roughness Measurements
Reactive Magnetron Sputtering of Hard Si-C-N and Si-B-C-N Films and Their Properties
Using NMR to Probe the Bonding in Amorphous Carbon Nitride Thin Films
DLC and CNx Coatings Produced by Pulsed Laser and Filtered Vacuum Arc Techniques
Fabrication and Properties of Ultra-nano, Nano, and Polycrystalline Diamond Membranes and Sheets
Nanotribological Properties of Nanocomposite and Amorphous CrBN Thin Films
SS1-MoA
Growth of Ordered and Disordered Arrays of Silicon Pillars During Laser-Assisted Etching
Defect-driven Photodesorption at UV and VUV Excimer Laser Wavelengths
Hot Electron Generation and Detection from Chemical Reactions on Metal Surfaces
Factors Influencing Ion Yields and Angular Distributions in Electron Stimulated Desorption
Effects of Water Ice Films on Thermal Stability and Electron-activated Decomposition of CF2Cl2 on Metal Surfaces
Water Enhanced Decomposition and Nanometer Scale Structure Formation Generated by Radiative Exposure of Solid Surfaces
Electron-stimulated Reactions in Thin Amorphous Solid Water Films on Pt(111).
Temperature-Dependent Thresholds for Ion-Stimulated Surface Diffusion: Experiments with Second Harmonic Microscopy
Femtosecond Photo-generated Carrier and Reaction Dynamics on a Chlorinated Silicon Surface: Reaction Yield Calculation by Rate Equation of Adsorbed Chlorine
SS2-MoA
Super Hydrophobic Interactions: From the Inside and Out
Friction Anisotropy at Pd(100)/Pd(100) Interfaces
Direct Observation of Superlubricity
The Role of the Third Body Processes in the Friction and Wear of MoS2 and MoST Coatings
Molecular and Bulk Material Mechanisms of Smooth and Stick-slip Sliding
Evaluation of the Surface Characteristics and Mechanical Properties of Interconnect Films and their Correlation with CMP Process
A Comparative Study of the Adhesion, Friction, and Mechanical Properties of CF3 and CH3 Terminated Alkanethiol Monolayers
Reaction of Trimethylphosphate with TiC and VC(100) Surfaces
Degradation of Self-Assembled Monolayer in Humid Environments
SS3-MoA
Catalysis by Supported Metal Nanoclusters
Gold Nano-Clusters on Rutile TiO2(110) - A Combined UHV and High Pressure STM Study
Dimethyl Methylphosphonate Decomposition on Supported Ni Nanoparticles Deposited on a TiO2(110) Surface
Dynamics and Chemical Reactivity of Au on TiO2 (110) Rutile
Oxygen-Induced Morphological Changes in Cu and Ni Islands on TiO2(110)
Chemical Reactions on Free Iridium and Platinum Clusters
STM Study of Copper Growth on ZnO(0001)-Zn and ZnO(0001bar)-O Surfaces
Charge Exchange between Alkali Ions and Nanocrystal Metal Surfaces
Electronic Detection of Oscillatory Reactions on Supported Platinum Particles
TF-MoA
The Application of Plasma for Metal Atomic Layer Deposition for Cu Interconnect Technology
Copper Atomic Layer Deposition Using In Situ-Generated Cu3Cl3 and Hydrogen Radicals
Dynamic Equipment and Process Simulation for Atomic Layer Deposition Technology
Al2O3 Atomic Layer Deposition for the Enhancement of MEMS Performance and Reliability
Processes and Properties of Porous CVD Low-k Materials
Deposition of Low k OSG Films Exhibiting Enhanced Mechanical Properties by PECVD
Expanding Thermal Plasma for Low-k Dielectrics: Guiding the Film Chemistry by Means of Selected Dissociation Paths in the Plasma
Photoresist Removal on Porous Low-k Materials Using an Energetic (100s of eV) Oxygen Neutral Beam
Sessions | Time Periods | Topics | Schedule Overview