AVS1999 Tuesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
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Click a Session in the first column to view session papers.
Session | Tuesday, October 26, 1999 | ||||||||||
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2:00 PM | 3:00 PM | 4:00 PM | 5:00 PM | ||||||||
AS-TuA |
A Microscopic View of Energetic Desorption Events
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Theory of Multi-Atom Resonant Photoemission
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Oxide-free Phosphate Films on Metals probed by Core and Valence Band X-Ray Photoelectron Spectroscopic Studies in an Anaerobic Cell
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Spatial Resolution in Scanning Auger Microanalysis of Complex Systems
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Atomic Level Characterization of Metal-Ceramic Interface Energetics and Dynamics via Ab Initio Methods
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Surface Science Studies of Model Ziegler-Natta Polymerization Catalysts
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Dynamic Monte Carlo Simulations of Catalytic Surface Reactions: CO + NO on Rhodium
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BI-TuA |
Surface Characterization of Biomaterials with Protein Layers
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Surface-plasmon Field-enhanced Fluorescence Spectroscopy and -Microscopy for the Evaluation of the Hybridization Reaction of Oligonucleotides
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Characterization of Supported Biomimetic Films Using Broadband Vibrationally Resonant Sum-Frequency Generation
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Biosensors in Biomaterials Research
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Direct Probing of the Surface Ultrastructure and Molecular Interactions of Living Microbial Cells with Atomic Force Microscopy
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Contact Mechanical Properties of Confined NIPAM Films at the Biomaterial Interfaces
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Novel Biomaterials through Tailoring of Solid Surfaces
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Photoisomerization and Photo-induced Alignment of Ordered Polymer Ultrathin Films Containing DNA and Polypeptide Layers: Possibilities for Optobioelectronic Substrates
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EM-TuA |
Challenges in Gate Dielectric Scaling
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Investigation of Titanium Nitride Gates for Tantalum Pentoxide and Titanium Dioxide Dielectrics
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Separate and Independent Reductions in Direct Tunneling in Oxide/Nitride Stacks with Monolayer Interface Nitridation Associated with the i) Interface Nitridation and ii) Increased Physical Thickness
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High K Gate Dielectrics for Sub-100nm CMOS
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Evidence of Aluminum Silicate Formation at the Al2O3/Si Interface for Thermal and Plasma Enhanced Chemical Vapor Deposited Al2O3 Thin Films
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Thermally Grown Gate Insulators for Heterostructure p-MOSFETs
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Deposition of ZrO2/SiO2 Alloys by 300° Remote Plasma Processing for Alternative High-K Gate Dielectrics in Aggressively Scaled CMOS Devices
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FP+ |
Nanoprobing Electrical Transport in Organic Semiconductors
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Photolithographically Defined Pentacene Thin Film Transistors on Flexible Plastic Substrates
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Reduced Process Complexity Organic Thin Film Transistors
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Soft Lithographic Patterning and Low Temperature Film Deposition: Methods to Fabricate Amorphous Silicon Thin Film Transistors at Low Temperature
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Low Damage Etching Utilizing Activated Hydrogen Beam for ITO Transparent Electrode in Flat Panel Display
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Excimer Laser Processing for a-Si and poly-Si Thin Film Transistors for Imager Applications
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Solid-phase Crystallization of Hydrogenated Amorphous Silicon-Germanium Alloy Films
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MI-TuA |
Electronic Structure of Single Crystal CrO2
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Underlying Simplicity of Magnetic Dichroism in the Photoelectron Spectroscopy of Gd
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Element-Resolved Magnetism Using Core-Resonant Magneto-Optical Techniques
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Interatomic Effects in Resonant Photoemission in Fe/Cr Alloys and Bilayers
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Dispersions of Metallic Quantum Well States in the Cu/fccM(100) [M = Ni, Co, Fe] Systems
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Photoemission Study of Pseudomorphic FexNi1-x and CoxNi1-x Films on Cu(100)
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Magnetic Properties of Fe-based Alloys
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MS-TuA |
CD Control Optimization Methodology on Shallow Trench Isolation Substrate for Sub-0.25µm Technology Gate Patterning
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Patterning of Xerogel in High Density Fluorocarbon Plasmas
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Surface Science of Tungsten CMP Removal
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Yield Improvement Through Multizone Uniformity Control of a CMP Process Utilizing a Pre and Post-Measurement Strategy
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Modeling, A Tool for Technology Development
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Simulations of TiN Barrier Films Deposited by I-PVD on High Aspect Ratio Features: Macrostructure and Composition
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Investigation of Si and SiO2 Etch Mechanisms Using an Integrated Surface Kinetics Model1
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Design of a Dual Frequency PECVD Reactor for Advanced Integrated Circuits Processing
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NS-TuA |
Size, Shape, Strain, and Composition Inhomogeneities of In0.5Ga0.5As QDs Grown by Migration Enhanced Epitaxy
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Cross-Sectional Scanning Tunneling Microscopy as a Probe of Atomic-Scale Order in MOVPE Grown GaInP1
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Interpreting Atomic-Scale Structure in Cross-Sectional STM Images of III-V Superlattices
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The Importance of Many-body Effects in the Clustering of Charged Zn Dopant Atoms in GaAs
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New Methods to Measure Electrical, Optical, and Magnetic Properties on the Nanometer Scale
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Field Dependent Electric Potential Gradients at Atomically Abrupt Oxide Interfaces
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Dynamics of Adsorbate Islands with Nanoscale Spacial Resolution: (OH)n Formation during the NO/H2 Reaction on Pt(001)
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Measuring Average Tip-sample Forces in Intermittent-contact (Tapping) Force Microscopy in Air
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Imaging the Near-field Intensity Gradients with a Tapping-mode Near-field Scanning Optical Microscope
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OE+ |
Tailoring of Properties of Organic Thin Films by Interface Control
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Ordering in Two Dimensions - Phthalocyanines, Perylenes, and Related Molecular Thin Films
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Influence of Steps on the Orientation of Monolayer Films of Copper Phthalocyanine (CuPc) on Au(111)
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Growth Modes of N,N'-bis-(1-naphthyl)-N,N'-diphenyl1-1,1-biphenyl1-4,4'-Diamine on Standard and Ultra-flat Indium Tin Oxide
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Self-Assembled Monolayers on Indium Tin Oxide
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Mechanism of Formation of Self-Assembled n-Octadecylsilane Monolayers on Indium-Tin-Oxide
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Growth and Characterization of Poly(arylamine) Thin Films Prepared by Vapor Deposition
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HREELS Study of Ultra-thin Polyaniline Films Grown on Cu(110) by Vapor Deposition of Aniline Tetramers
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PS-TuA |
Infrared and Microwave Absorption Diagnostics of Plasmas for Silicon Oxide Etching and Deposition
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Thomson Scattering with Gated Intensified CCD Detectors for Diagnostic of rf Discharge Plasmas
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Determination of Electron Temperatures and Species Concentrations During Aluminum Etching
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Peter Mark Memorial Award Address
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Cavity Ring Down Spectroscopy for the Detection of Hydrocarbon Radicals during a-C:H Deposition
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Characterization of Transformer Coupled Oxygen Plasmas by Trace Rare Gas-Optical Emission Spectroscopy and Langmuir Probe Analysis
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Diagnostics of Large-area Plasma Produced by Surface Waves on a Metal Wall with Periodicity
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UV Absorption Spectroscopy of Pulsed Fluorocarbon Plasmas
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SS1+ |
Noncommutative Band Offset at α-Cr2O3/α-Fe2O3(0001) Heterojunctions
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Ultrathin Iron Oxide Films
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Islanding, Facetting, and the Lattice Relaxation in the Growth of α-Fe2O3 on α-Al2O3
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Surface Reconstructions of Fe3O4(001)
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The Surface Structure of α-Al2O3(0001) Studied by LEED
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Formation of Epitaxial Al2O3 on Ni3Al(111) Studied by STM, HREELS, UPS, ΔΦ, and LEED
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Surface Structure Determination of Yttrium-Stabilized ZrO2(001) Surface Using X-Ray Photoelectron Diffraction
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Epitaxial Growth and Characterization of Zirconium-Doped CeO2(111) Thin Films on Yttria-Stabilized Zirconia(111)
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Structure and Dynamics of KTaO3(001) via Elastic and Inelastic Helium Atom Scattering1
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Deposition of Highly Oriented Mg3(VO4)2 Thin Films for Use in Catalysis Studies
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SS2+ |
Medard W. Welch Award Address: Halogen Etching of Si with Emphasis on Atomic-Scale Processes
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Micrometer-scale "Grooves" and Step Bunching during Extended Oxidation-induced Etching of Si(001) Surfaces
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The Structure of Steps on Hydrogen-Passivated Si Surfaces
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Microscopy of Si(001) Surface Defects Produced by keV He Ion Irradiation at Low Temperatures
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A Variable Temperature Scanning Tunnelling Microscopy Study of Si(100) Etching Dynamics
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Dissociative Adsorption and Recombinative Desorption of H2 on Si(100)-2x1
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Novel Mechanisms for Plasma Etch Front and CVD (Chemical Vapor Deposition) Growth Front Roughening
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Resonance-Enhanced Multiphoton Ionization Studies of the Etching of Silicon by Molecular Chlorine
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Femtosecond Photo-induced Dynamics on a Cleaned and a Chlorinated Si(111) Surfaces
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SS3-TuA |
Mechanisms and Energetics in Diffusion of O2-Molecules and H-atoms on Si(1x1)-7x7 Surfaces
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Real-Time Imaging of Step Motion on Cu(100) with the Low Energy Electron Microscope1
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Diffusion and Dynamics of 2D Clusters on Crystal Surfaces
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Sulfur's Effect on Cu(111) Surface Morphology
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Influence of Adsorbates on the Self-diffusion of Pt Adatoms and the Stability of Pt Dimers
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Study of Subsurface Hydrogen in Pd(111) by STM
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Enhanced Interlayer Mass Transport and Dynamics of Film Smoothening on a Symmetry-broken Ag(111) Surface
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Ion-Enhanced Surface Diffusion: Experiment and Simulation
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The Effect of As4 Flux on the Ga Diffusion on the GaAs(001)-(2x4) Surface
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TF-TuA |
Preparation of Co and CoNx Thin Films by Unbalanced r.f. Magnetron Sputtering
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Microstructural Control of Thin Silicon Films Grown by Reactive Magnetron Sputtering Utilizing Low Energy Ion Bombardment
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PVD of Thin Film Silicon: How Fast Light Atom and Slow Heavy Ion Bombardment During Growth Promote Low-Temperature Crystallinity
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Deposition Behavior and Film Characteristics of Aluminum Oxide Deposited using High Frequency Pulsed-DC Magnetron Reactive Sputtering
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AC Reactive Sputtering of Dielectric Films using a Dual Magnetron
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Characterization Studies of Reactively Pulsed Magnetron Sputtered Alumina Films
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Change in Surface Roughness with the Thickness of TiO2 Film Grown on MgO(001) by Ar-ion Beam Sputtering
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Chemical Vapor Deposition of Alpha Aluminum Oxide for High Temperature Aerospace Sensors
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Phase Development of Radio Frequency Magnetron Sputter Deposited Pb(Mg1/3Nb2/3)O3-PbTiO3 (90/10) Thin Films
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VM+ |
Ultra Thin DLC Film as Magnetic Disks Overcoat
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Tribological Properties of Protective Carbon Coatings Used in Magnetic Storage Devices Investigated on a Sub-Nanometer Scale
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Ultrathin Overcoats For Magnetic Media: Is Hardness What We Are Looking For ?
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Air Bearing Collision Dynamics
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Interaction of Fluoroalcohols and Fluoroethers with Various Types of Carbon Overcoats
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Angle Resolved ESCA Methods: Molecular Conformation of Fluorocarbon Lubricant
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Airbearing Designs for High Density Recording
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VT-TuA |
Vacuum Systems, Deposition Sources, Measurement and Control Tools for the Semiconductor Industry (1950-1975)
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Evolution of Integrated Circuit Vacuum Processes: 1962-1975
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History of Plasma Ashing and Plasma Etching in the Semiconductor Industry from 1950 to 1975
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History of Commercial Ion Implantation
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Application of Sub-atmospheric Plasmas to Semiconductor Device Processing
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Refining Old Vacuum Knowledge for Today's Semiconductor Manufacturing Processes
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