ALD2023 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session	Wednesday, July 26, 2023
Session	1:30 PM				2:30 PM				3:30 PM			4:30 PM

AA1-WeA	Synthesis of Low-k SiCNO Thin Films by Plasma-enhanced Atomic-molecular Layer Deposition with Tetra-isocyanate-silane (TICS) and Phloroglucinol (Phl)	Performance and Thermal Stability Improvement of Vertical-Channel Thin-Film Transistor by Controlling Deposition Temperature of Gate Stack Prepared by Atomic Layer Deposition	Sequential Design of PEALD In-Ga-Zn-O Active Layer: Sub-cycle Engineering of Indium Oxide Layer for Highly Stable TFT	Bilayer Channel Combination Strategy via Atomic-Layer Deposition of In-Sn-O/In-Sn-Zn-O Structures for Highly-Functional Oxide Thin-Film Transistors	Elaboration of Refractory Metamaterials by Atomic Layer Deposition for Tuning Thermal Emission at High Temperature	Optical Properties of Interconnected Plasmonic Nanostructures with sub-10 Nm Nanogaps by Area-Selective Atomic Layer Deposition	Electrochemically Active Antibacterial Electrodes for Neural Interfacing Applications	Ultrathin TiO₂ ALD Coatings Strongly Enhance Biological Response of Biomedical Materials	Break
AA2-WeA										Atomic Layer Deposition of Highly Stable and Efficient Perovskite Solar Cells (~ 24%)		ALD of Niobium Oxide (Nb₂O₅) and Niobium-doped Titanium Oxide (Nb:TiO₂) for Solar Cell Applications	Closing Remarks
AF1-WeA	Effect of Inhibitor Adsorption on the Mechanisms for Selectivity Loss		Electronic Structure of ALD Al₂O₃/TiO₂ Heterointerfaces: A First-principles Study	Reaction Mechanism of Bifunctional Organic Reactants and Diethylzinc for Atomic and Molecular Layer Deposition	Simulated Conformality of ALD Growth Inside Lateral HAR Channels: Comparison between a Diffusion-Reaction Model and a Ballistic Transport-Reaction Model	Simulated Conformality of ALD in Lateral High Aspect Ratio Channels: Impact of Knudsen Number on the Saturation Profile	Atomistic Modeling of Thin-Film Deposition with Carrier Gases	Chemistry of Plasma-Enhanced and Thermal Atomic Layer Deposition of Metal and Intermetallic Thin Films: The Role of Substrates and Reducing Agent	Break
AF2-WeA										Revealing Process-Structure Relationships for ALD Amorphous Oxide Semiconductors with XANES and First-Principles Modeling	Machine-Learning Aided Understanding of ALD Processes	Digital Twin and Experimental Platform for AI-Driven Optimization of ALD Processes	Closing Remarks in Grand Ballroom H-K
EM1-WeA	MLD/ALD of Hybrid Dielectrics for Flexible Electronic Devices		The Molecular Evolution of Zno Sequential Infiltration Synthesis	Conformal ALD/MLD of Perfectly Stable Zn-Benzenedithiol Thin Films	Recent Developments in Oxidative Molecular Layer Deposition (oMLD)	In Situ Analysis of Growth Mechanism During Molecular Layer Deposition of Polyurea	A Chemist’s Lego Blocks: Molecular Layer Deposition (MLD) for Nanoelectronic Applications		Break
LB1-WeA		Recent Advances for Spatial Atomic Layer Deposition Process: Microreactor Direct Atomic Layer Processing (μDALP™)	Towards Improved Conversion of Wet Waste to Jet Fuel with Atomic Layer Deposition-Coated Hydrodeoxygenation Catalysts	A Kinetic Model for Heterogeneous Nucleation in ALD and CVD	Intrinsic Area Selective Atomic Layer Deposition of MoS₂ Thin Films	Selective Deposition of HfO₂ on Aminosilane-treated TiN/SiO₂ Substrates	Atomic Layer Deposited Zr-doped HfO₂ (HZO) and Indium Gallium Oxide (IGO) Thin Films for 3D Gate-All-Around FeFET	Development of Robust Gate Insulators for MIS-HEMT Structures Based on ALD/PEALD Techniques	Break
LB2-WeA										Exploring the Blocking Mechanism of Small Molecule Inhibitors by Density Functional Theory	Reaction Mechanism of Atomic Layer Deposition of Pt from First Principles		Closing Remarks in Grand Ballroom H-K

Sessions | Time Periods | Topics | Schedule Overview