ALD2023 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, July 26, 2023
1:30 PM 2:30 PM 3:30 PM 4:30 PM
AA1-WeA
Synthesis of Low-k SiCNO Thin Films by Plasma-enhanced Atomic-molecular Layer Deposition with Tetra-isocyanate-silane (TICS) and Phloroglucinol (Phl)
Performance and Thermal Stability Improvement of Vertical-Channel Thin-Film Transistor by Controlling Deposition Temperature of Gate Stack Prepared by Atomic Layer Deposition
Sequential Design of PEALD In-Ga-Zn-O Active Layer: Sub-cycle Engineering of Indium Oxide Layer for Highly Stable TFT
Bilayer Channel Combination Strategy via Atomic-Layer Deposition of In-Sn-O/In-Sn-Zn-O Structures for Highly-Functional Oxide Thin-Film Transistors
Elaboration of Refractory Metamaterials by Atomic Layer Deposition for Tuning Thermal Emission at High Temperature
Optical Properties of Interconnected Plasmonic Nanostructures with sub-10 Nm Nanogaps by Area-Selective Atomic Layer Deposition
Electrochemically Active Antibacterial Electrodes for Neural Interfacing Applications
Ultrathin TiO2 ALD Coatings Strongly Enhance Biological Response of Biomedical Materials
Break
AA2-WeA
Atomic Layer Deposition of Highly Stable and Efficient Perovskite Solar Cells (~ 24%)
ALD of Niobium Oxide (Nb2O5) and Niobium-doped Titanium Oxide (Nb:TiO2) for Solar Cell Applications
Closing Remarks
AF1-WeA
Effect of Inhibitor Adsorption on the Mechanisms for Selectivity Loss
Electronic Structure of ALD Al2O3/TiO2 Heterointerfaces: A First-principles Study
Reaction Mechanism of Bifunctional Organic Reactants and Diethylzinc for Atomic and Molecular Layer Deposition
Simulated Conformality of ALD Growth Inside Lateral HAR Channels: Comparison between a Diffusion-Reaction Model and a Ballistic Transport-Reaction Model
Simulated Conformality of ALD in Lateral High Aspect Ratio Channels: Impact of Knudsen Number on the Saturation Profile
Atomistic Modeling of Thin-Film Deposition with Carrier Gases
Chemistry of Plasma-Enhanced and Thermal Atomic Layer Deposition of Metal and Intermetallic Thin Films: The Role of Substrates and Reducing Agent
Break
AF2-WeA
Revealing Process-Structure Relationships for ALD Amorphous Oxide Semiconductors with XANES and First-Principles Modeling
Machine-Learning Aided Understanding of ALD Processes
Digital Twin and Experimental Platform for AI-Driven Optimization of ALD Processes
Closing Remarks in Grand Ballroom H-K
EM1-WeA
MLD/ALD of Hybrid Dielectrics for Flexible Electronic Devices
The Molecular Evolution of Zno Sequential Infiltration Synthesis
Conformal ALD/MLD of Perfectly Stable Zn-Benzenedithiol Thin Films
Recent Developments in Oxidative Molecular Layer Deposition (oMLD)
In Situ Analysis of Growth Mechanism During Molecular Layer Deposition of Polyurea
A Chemist’s Lego Blocks: Molecular Layer Deposition (MLD) for Nanoelectronic Applications
Break
LB1-WeA
Recent Advances for Spatial Atomic Layer Deposition Process: Microreactor Direct Atomic Layer Processing (μDALP™)
Towards Improved Conversion of Wet Waste to Jet Fuel with Atomic Layer Deposition-Coated Hydrodeoxygenation Catalysts
A Kinetic Model for Heterogeneous Nucleation in ALD and CVD
Intrinsic Area Selective Atomic Layer Deposition of MoS2 Thin Films
Selective Deposition of HfO2 on Aminosilane-treated TiN/SiO2 Substrates
Atomic Layer Deposited Zr-doped HfO2 (HZO) and Indium Gallium Oxide (IGO) Thin Films for 3D Gate-All-Around FeFET
Development of Robust Gate Insulators for MIS-HEMT Structures Based on ALD/PEALD Techniques
Break
LB2-WeA
Exploring the Blocking Mechanism of Small Molecule Inhibitors by Density Functional Theory
Reaction Mechanism of Atomic Layer Deposition of Pt from First Principles
Closing Remarks in Grand Ballroom H-K
Sessions | Time Periods | Topics | Schedule Overview