ALD2023 Monday Afternoon

Precursors for Photoassisted Area Selective Deposition on Self Assembled Monolayers

Reductive Thermal ALD of Pd and Au Thin Films

Phosphorus Zintl Species as ALD precursors for Metal Phosphide Thin Films

Investigation of Discrete Reactant Feeding for Atomic Layer Deposition of In₂O₃ Using Novel Liquid Alkyl-Cyclopentadienyl Indium Precursor

Synthesis and Precursor Property Evaluation of Er Enaminolate Complexes and Deposition of Er₂O₃ Thin Film using Thermal Atomic Layer Deposition (ALD)

Deposition of CsSnI₃ Perovskite Thin Films by Atomic Layer Deposition and Pulsed Chemical Vapor Deposition

Student Award Finalist Talk: Thermal characterization and Area Selective Deposition of NHCs

Student Award Finalist Talk: Reaction Mechanism on ALD Process of Ru and Pt

Student Award Finalist Talk: Thermal Atomic Layer Etching of Gold Using Sulfuryl Chloride for Chlorination and Triethylphosphine for Ligand Addition

Student Award Finalist Talk: Conformality of Atmospheric-Pressure Plasma-Enhanced Spatial Atomic Layer Deposition of SiO­­₂ and TiO₂

Student Award Finalist Talk: “Inverted ASD” with High Selectivity: Polymer on SiO₂ vs. Si-H and Polymer on Si-OH vs. SiO₂

Student Award Finalist Talk: Plasma Isotropic ALE of GaN Using SF₆ Plasma and TMA

Student Award Finalist Talk: Competition between Deposition and Etching Reactions in ALD of Indium Gallium Zinc Oxide (IGZO)

Student Award Finalist Talk: Atomic Layer Deposition of Semimetallic TiS2 Contact Layer on MoS2-based Thin Film Transistor for Contact Resistance Reduction

Wet Atomic Layer Etching of Metals

Thermal Atomic Layer Etching of Molybdenum Based on Sequential Oxidation and Chlorination Reactions

Non-Halogen Plasma for Selective Removal of Titanium Compounds Applied in Advanced Atomic Layer Etching

Leveraging Surface Nitridation to Enable Plasma-Thermal Atomic Layer Etching of Ni Based Metals

Plasma Atomic Layer Etching of Ruthenium with Surface Fluorination and Ion Bombardment for Next-generation Interconnect Metal

Comparison of Ruthenium ALE based on ICP and Ion Beam

A Modified ALD-like Approach to Demonstrate Exceptionally Thin Dielectric Layer Growth on 2D Materials

Water-free SbO_x-ALD-process for Coating Bi₂Te₃-particles

2D FeS_X Nanosheets by ALD: Electrocatalytic Properties Towards Hydrogen Evolution Reaction

300 mm Wafer-Scale and Self-limiting Layer Synthesis of 2D MoSe₂ by Atomic Layer Deposition

Wafer-Scale Controlled Growth of Two-Dimensional Metal Dichalcogenides Through Atomic Layer Deposition and Top-Bottom Epitaxy