ALD/ALE 2022 Tuesday Afternoon

High-Stability and High-Performance PEALD-IZO/IGZO Top-Gate Thin-Film Transistor via Nano-Scale Thickness Control

Impacts of Deposition Temperatures on Insulation Properties of Atmospheric Pressure Spatial ALD Al₂O₃ Thin Films for Flexible PEALD IGZO TFT

Enhanced Crystallinity Using in-Situ Atomic Layer Deposition Process of Al₂O₃ on P-Type SnO Thin Film and the Associated Device Applications

Oxidant- and Temperature-Dependent Growth Behavior of ALD-Processed ZnO Thin Films and their Applications inTransistors

Facile Control of p-type SnO TFT Performance with Restraining Redox Reaction by ITO Interlayers

Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Titanium Nitride Using Ammonia Reactive Background Gas

Atomic Layer Deposition of MoNx Thin Film Using New Synthesized Liquid Mo Precursor

Atomic Layer Deposition of Tungsten Nitride Thin Film using WCl₅ as a Fluorine-free W Precursor and its Application into the Diffusion Barrier for Cu and Ru Interconnects

Thermal Atomic Layer Deposition of Ru With H₂ Molecules for Emerging Ru Interconnects

The Oxygen-Free Thermal ALD and Area Selective ALD of Ruthenium Film

ALD-Prepared 2D Transition Metal Dichalcogenides as Diffusion Barriers in Interconnects

Evolution of Structural and Electrical Properties of Molecular Layer Deposited Hafnicone Films after Thermal Processing for Applications in Low-K Etch Stops

Reaction Mechanisms of ALD of Transition Metal Oxides from Metal Amido Complexes and Water

An in-Vacuo X-Ray Photoelectron Spectroscopy Study of the Reaction of Trimethylaluminum With Water, Oxygen and Argon Plasma for Low Temperature Atomic Layer Deposition

In Vacuo Cluster Tool for Studying Reaction Mechanisms in ALD and ALE Processes

Watching the ALD of Pt Films in Real-Time

In Situ X-Ray Studies of Lamellar Dichalcogenides Prepared by Molecular Layer Deposition and Thermal Annealing

Effect of O₂ Plasma Exposure Time During Atomic Layer Deposition of Amorphous Gallium Oxide

Pyroelectric Calorimetry: Measuring the Time-Resolved Heat of ALD Half Reactions

Get the Full Picture: Full-Range Time-Resolved In Situ Mass Spectrometry During ALD

Strategies to Produce Boron-Containing ALD Thin Films Using Trimethyl Borate Precursor: From Thermal to Plasma to Combined-Plasma Approach

Examining Large Grain Growth and Low Temperature Crystallization Kinetics for TiO₂ Thin Films Prepared by Atomic Layer Deposition (ALD)

Deposition and Characterization of Hafnium Dioxide Films Embedding Nickel Nanoparticles

Biased QCM for Studies of Reductive Surface Chemistry Induced by Plasma Electrons

NHC Monolayer Growth Behaviour and Film Durability Measured by QCM

Surface Reaction Mechanisms by Metal-Organic Compound Formations in Atomic Layer Etching Processes

Atomic Layer Etching of Al₂O₃ on Metallic Substrates Using in situ Auger Electron Spectroscopy

In-situ Optical Emission Spectroscopy as a Tool to Characterize Cyclic Quasi-Atomic Layer Etching

Atomic Layer Etching of CAR/SOG in EUV Patterning of 300 Mm Wafers - Selectivity and Roughness Mechanisms

Ab Initio Calculations on the Thermal Atomic Layer Etching of Copper

Damage Formation in the Underlying Silicon after the Removal of Silicon Nitride by Atomic Layer Etching: A Molecular Dynamics Study

Plasma Processes for Isotropic and Anisotropic Atomic Layer Etching

SF₆ and Ar Plasma Based Atomic Layer Etching of Gallium Nitride (GaN)

SF₆ Physisorption based Cryo-ALE of Silicon

Precision and Repeatability of ALE Process in AlGaN/GaN Layer by in-Situ Etch Depth Monitoring

Investigation of Self-Limiting Sputtering of Fluorinated Al₂O₃ and HfO₂: Where's the Limit?

Isotropic Plasma ALE of Al₂O₃ using F-based Plasma and AlMe₃: Key Parameters, Upscaling and Applications

Atomic Layer Deposition Equipment Used in Industrial Production of More Than Moore Devices

Spatial ALD on Large-Area Porous Substrates: How to Avoid Supply Limitation and Maximize Precursor Efficiency?

Atmospheric-Pressure Plasma-Assisted Spatial Atomic Layer Deposition of Silicon Nitride

Production-Suitable 200 Mm Batch ALD/MLD Thin Film Encapsulation Toward Flexible OLED Manufacturing

Roll-to-Roll ALD Coatings for Battery Cell Interfaces at Production Scale

An Innovative Method for in Situ Calorimetry of ALD/ALE Surface Reactions

High-Throughput Nanocoating Technology for Energy Applications

Optimizing Vapor Delivery of Transition-Metal Diazadienyl Complexes for ALD Processes

Inherently Selective Atomic Layer Process Based on Spatial Micronozzles: Microreactor Selective Area Direct Atomic Processing (µSADALP)

Atomic Layer Rastering

Maskless Localized Atomic Layer Deposition: Surface Structuration and Functionalization

New Spatial ALD/CVD Approaches for Area-Selective Deposition