ALD2020 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, June 30, 2020
8:30 AM 9:30 AM 10:30 AM 11:30 AM
AA-TuM
Atomic Layer Deposition Enabling Higher Efficiency Solar Cells
Atomic Layer Deposition of Zn1-xMgxO and Zn1-xMgxO: Al as Transparent Conducting Films for Chalcopyrite Solar Cells
Tuning Properties of ALD Oxide and Sulfide Materials for Photovoltaic Applications
Solar Cells Based on Phase-Pure Sb2S3 by Atomic Layer Deposition Forming Planar and Coaxial Heterojunctions
Metal Oxide Infilling of Quantum Dot Thin Films: Charge Separation, Stabilization, and Solar Cell Formation
ALD of Al2O3 on Perovskite Solar Cells: Role of Active Interfacial Engineering
AA2-TuM
Ultrathin TiN by Thermal ALD as Electrically Conducting Li-ion Diffusion Barrier for Integrated 3D Thin-Film Batteries
Atomic Layer Deposition of Nitrogen Doped Al- and Ti-Phosphate for Li-ion Battery Applications
Passivation of Lithium Metal Anodes with ALD Aluminum Fluoride
Next-Generation Li-ion Batteries Enabled by Large-Area Atmospheric-Pressure Spatial Atomic Layer Deposition
ALD Al2O3 and MoS2 Coated TiO2 Nanotube Layers as Anodes for Lithium Ion Batteries
Molecular Layer Deposition for Stabilization of Electrochemical Materials
AF1-TuM
Automated Design of Thermally Stable Heteroleptic Precursors by Computational Screening
Unravelling the Reaction Mechanisms of Trimethyl Borate for the Atomic Layer Deposition Boron- and Hydrogen-Doped Alumina Films with Non-uniform Transversal Doping Profiles
AF2-TuM
Role of Ions in Film Conformality and Quality during Plasma-Assisted ALD of SiO2 and TiO2
ALD Conformality: Effects of Process Parameters on the Simulated Saturation Profile
ALE1-TuM
Highly Selective Atomic Layer Etching for Semiconductor Application
Aspect-Ratio Dependence of Isotropic Thermal ALE and Mitigation Thereof
Precise Ion Energy Control with Tailored Waveform Biasing for Atomic Layer Etching
ALE2-TuM
GaN Damage Evaluation After Conventional Plasma Etching and Anisotropic Atomic Layer Etching
Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis
Atomic Layer GaN Etching by HBr Neutral Beam
LI2-TuM
Welcome and Introduction
Thermal Atomic Layer Deposition of Noble Metal Films Using Non-Oxidative Coreactants
Mixing It Up: Tuning Atomic Ordering in 2-D Mo1-xWxS2 Alloys by ALD
Deposition of Conductive PEDOT Thin Films with EDOT and ReCl5 Precursors
Break
Resistless Lithography Based on Local Surface Modification of Halogenated Amorphous Carbon
Mimicking Chitin and Chitosan Type of Functionality with Novel Thin Films Grown by Molecular Layer Deposition
Closing Remarks & Sponsor Thank You
Sessions | Time Periods | Topics | Schedule Overview