ALD2020 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, June 29, 2020
1:30 PM 2:30 PM 3:30 PM 4:30 PM 5:30 PM
AA1-MoA
Resistive Switching Maps for Films of Variable Conductivity Grown by Atomic Layer Deposition
Understanding and Controlling Release and Aerosolization of Inhaled Drug Particles Engineered by Atomic Layer Deposition
In-vitro Screening of Materials and Laminates by Atomic Layer Deposition for Medical Device Coatings
Break & Exhibits
ALD and PE-ALD of High-Mobility Zinc-Tin-Oxide Semiconductor Layers: Towards Printable Electronic Devices
Optimized Schottky Junctions by Atomic Layer Deposition for Piezotronic MEMS Strain Microsensors
Embedded Organics in Crystalline Fluorides: A One-Step Approach to Sensitized Luminescence
Atomic Layer Deposition of ZnO Quantum Dots for Optoelectronics
AF1-MoA
Atomic Layer Deposition of Ruthenium-Containing Thin Films using RuO4 as both the Co-Reactant and the Metal Source
Visual Screening of Precursors for ALD/MLD
β-Silyl-Diamides and β-Silyl-Amidoamines Lead to Unusual Co(II & IV) Precursors
A Low Cost, High Efficiency TMA-Replacement for the Deposition of Pure Aluminum Nitride Films by ALD
Break & Exhibits
Polymeric Tin Trifluoroacetate Precursors for Atomic Layer Deposition of Fluorine-Doped Tin(IV) Oxide
Highly Volatile In(III) Triazenide Precursors for Atomic Layer Deposition of Indium Nitride
AF2-MoA
Ion Energy Distribution and Fluxes for a Newly-Designed Remote Plasma Source for ALD for GaN Devices
Plasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?
Recent Advances in Hollow Cathode Technology for Plasma Assisted ALD
Detection of Oxygen Vacancies in H2-Plasma Enhanced Atomic Layer Deposited (PEALD) Ferroelectric Hafnia Zirconia Thin Films
Effect of an Electric Field on the Material Properties of Hafnium Oxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition
Study of the Surface Species During Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films using In-situ IR-Spectroscopy and Iin Vacuo X-ray Photoelectron Spectroscopy
AF3-MoA
As Deposited Epitaxial Functional Complex Oxides - Enabling Novel Technology
RT Atomic Layer Deposition of Aluminum Silicate and its Application to Ion Sorption Surfaces
Nucleation and Growth of Thermal ALD Au Films - Towards Coalescence of Ultrathin Films
ABC-Type Pulsing for Improved ALD of Group 13 Nitrides using Trialkyl Metal Precursors
Atomic Layer Deposition of Metal Thin Film using Discrete Feeding Method (DFM) and Electric Field/Potential Assisted-Atomic Layer Deposition (EA-ALD)
ALE1-MoA
Mechanistic Insights into Thermal Dry Atomic Layer Etching of Metals and Alloys
Thermal Atomic Layer Etching of Nickel Using SO2Cl2 and P(CH3)3
Thermal-Plasma ALE on Selected Metals for EUV and Integration Processes
Thermal-Cyclic Atomic Layer Etching of Cobalt via Organometallic Complex
ALE2-MoA
Ab Initio Study on the Surface Reactions of Thermal Atomic Layer Etching of Al2O3
Volatile Products from Thermal Atomic Layer Etching Observed using Mass Spectrometer with Line-of-Sight Detection
Blocking Thermal Atomic Layer Etching with Removable Etch Stop Layers
Mechanism of the HF Pulse in the Thermal Atomic Layer Etch of HfO2 and ZrO2: A First Principles Study
Thermal Atomic Layer Etching of Ta2O5 and TaN using BCl3 and HF: Evidence for a Conversion-Etch Mechanism
Sessions | Time Periods | Topics | Schedule Overview