ALD2020 Monday Afternoon

Resistive Switching Maps for Films of Variable Conductivity Grown by Atomic Layer Deposition

Understanding and Controlling Release and Aerosolization of Inhaled Drug Particles Engineered by Atomic Layer Deposition

In-vitro Screening of Materials and Laminates by Atomic Layer Deposition for Medical Device Coatings

ALD and PE-ALD of High-Mobility Zinc-Tin-Oxide Semiconductor Layers: Towards Printable Electronic Devices

Optimized Schottky Junctions by Atomic Layer Deposition for Piezotronic MEMS Strain Microsensors

Embedded Organics in Crystalline Fluorides: A One-Step Approach to Sensitized Luminescence

Atomic Layer Deposition of ZnO Quantum Dots for Optoelectronics

Atomic Layer Deposition of Ruthenium-Containing Thin Films using RuO₄ as both the Co-Reactant and the Metal Source

Visual Screening of Precursors for ALD/MLD

β-Silyl-Diamides and β-Silyl-Amidoamines Lead to Unusual Co(II & IV) Precursors

A Low Cost, High Efficiency TMA-Replacement for the Deposition of Pure Aluminum Nitride Films by ALD

Polymeric Tin Trifluoroacetate Precursors for Atomic Layer Deposition of Fluorine-Doped Tin(IV) Oxide

Highly Volatile In(III) Triazenide Precursors for Atomic Layer Deposition of Indium Nitride

Ion Energy Distribution and Fluxes for a Newly-Designed Remote Plasma Source for ALD for GaN Devices

Plasma-Enhanced Atomic Layer Deposition of Cobalt and Cobalt Nitride: What Controls the Incorporation of Nitrogen?

Recent Advances in Hollow Cathode Technology for Plasma Assisted ALD

Detection of Oxygen Vacancies in H₂-Plasma Enhanced Atomic Layer Deposited (PEALD) Ferroelectric Hafnia Zirconia Thin Films

Effect of an Electric Field on the Material Properties of Hafnium Oxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition

Study of the Surface Species During Thermal and Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Films using In-situ IR-Spectroscopy and Iin Vacuo X-ray Photoelectron Spectroscopy

As Deposited Epitaxial Functional Complex Oxides - Enabling Novel Technology

RT Atomic Layer Deposition of Aluminum Silicate and its Application to Ion Sorption Surfaces

Nucleation and Growth of Thermal ALD Au Films - Towards Coalescence of Ultrathin Films

ABC-Type Pulsing for Improved ALD of Group 13 Nitrides using Trialkyl Metal Precursors

Atomic Layer Deposition of Metal Thin Film using Discrete Feeding Method (DFM) and Electric Field/Potential Assisted-Atomic Layer Deposition (EA-ALD)

Mechanistic Insights into Thermal Dry Atomic Layer Etching of Metals and Alloys

Thermal Atomic Layer Etching of Nickel Using SO₂Cl₂ and P(CH₃)₃

Thermal-Plasma ALE on Selected Metals for EUV and Integration Processes

Thermal-Cyclic Atomic Layer Etching of Cobalt via Organometallic Complex

Ab Initio Study on the Surface Reactions of Thermal Atomic Layer Etching of Al₂O₃

Volatile Products from Thermal Atomic Layer Etching Observed using Mass Spectrometer with Line-of-Sight Detection

Blocking Thermal Atomic Layer Etching with Removable Etch Stop Layers

Mechanism of the HF Pulse in the Thermal Atomic Layer Etch of HfO₂ and ZrO₂: A First Principles Study

Thermal Atomic Layer Etching of Ta₂O₅ and TaN using BCl₃ and HF: Evidence for a Conversion-Etch Mechanism