ICMCTF2017 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Tuesday, April 25, 2017 | ||||||||
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8:00 AM | 9:00 AM | 10:00 AM | |||||||
A1-3 |
Thin Co and Ce/Co Coatings on Ferritic Stainless Steel Interconnects for Solid Oxide Fuel Cells
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Long-term Oxidation of MCrAlY Coatings at 1000 ⁰ C and an Al-activity Based Coating Life Criterion
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The Preparation of Ti2AlN MAX Phase Coatings and its Oxidation Mechanism under Different Atmosphere
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Effect of Coating Architecture on the Corrosion Behavior of Ti-N/Cr-N Multilayer Coatings
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Effects of Encapsulating Material and Healing Agent Ratio on Crack Propagation Behavior for Thermal Barrier Coatings
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B1-3 |
Synthesis and Applications of High-precision Thin Film Multilayers
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Influences of Frequency and Duty Cycle on the Mechanical Properties of TiCrBN Thin Films Grown by a Hybrid Superimposed High Power Impulse Magnetron Sputtering and Radio Frequency sputtering technique
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Controllably Manipulating Adatom Mobility during PVD Deposition through Surface Acoustic Waves
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Effects of Processing Parameters on the Fabrication of TiCrSiN Thin Films Deposited by a Hybrid HiPIMS and RF Sputtering System
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Exploring the High-temperature Hardness of Nanocrystalline W-Ti Coatings
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Growth Mechanism of Sputter Deposited Self-assembled Alternating Layered Metal Containing Hydrogenated Amorphous Carbon Film
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Phase Formation in Sputter Deposited Tantalum Coatings
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B4-1 |
Thermal Stability and Mechanical Properties of Sub-stoichiometric TiAlN Thin Films
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Microstructure and Hardness of Ti-B-N-C Nanocomposites Deposited from Ti and B4C Targets
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Strategies for Fracture Toughness Enhancement of Nanostructured Films by Microstructural and Grain-boundary Design: The Role of Microstructure, Stress and Property Heterogeneity
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Epitaxial Growth of HfN Films using Synchronized Pulsed Substrate Bias during HiPIMS Discharge
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HiPIMS and Ni Doping Induced Structure Reinforcement and Phase Change in nc-TiC/a-C:H Coatings
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Correlation of Plasma Parameters and Thin Film Properties of HiPIMS Al-Cr-N films using a Combinatorial Approach
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C1 |
Metamaterials: from Design and Modeling to the Experimental Confirmation of their Optical Performance
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Use of FDTD Method for Data Analysis of Spectroscopic Ellipsometry Data of Non-periodic sub-wavelength Structures
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Analysis Procedures for Multiple Sets of Ellipsometric Spectra
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High Precision Absorption Measurements in Optical Films using the TRACK Method: Comparison with the Laser-induced Deflection
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Durability and Wear Mechanisms of Easy-to-clean Coatings on Glass and Displays Assessed by in situ Tribometry
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Insitu Metrology for Surface Topography and Stress Characterization
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Scratch Failure vs Residual Stress: a Relationship Applied to Optical Coatings
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Fast Characterization of nm Thin to Thick Coatings using Pulsed-Rf Glow Discharge Optical Emission Spectrometry
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D3 |
Challenges for Polymeric Orthopedic Implants - Enhanced Surface Functionalities using coatings deposited by HiPIMS
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Alginate Coatings on Silver-decorated Calcium Phosphate nanospheres as an Antimicrobial coating component
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Manufacturing, Testing, and Regulatory Aspects of Implant Coatings
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Implant Alloy Microstructure can Enable Cell Induced Corrosion in Total Hip Replacements
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Characterization of Solid-supported Thin Films and Molecular Interactions using Multi-Parametric Surface Plasmon Resonance
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Effect of Processing on the Structure and Biofuncionalization of AlN Thin Films Produced by r.f. Reactive Magnetron Sputtering
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Effect of Zn on the Improvement of Corrosion Performance of MAO Coated Biodegradable Mg-Sr-Zn Alloys
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Antimicrobial Silver Oxide Films with Rapid Bacteria Contact Killing
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F2-1 |
An Ionization Region Model of the Reactive Ar/O2 High Power Impulse Magnetron Sputtering Discharge
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Residual Stress Control of Al-rich (Ti,Al)N Hard Coatings by Pulse Duration in High Power Impulse Magnetron Sputtering
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Energetic Deposition of Electronic Materials
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Controlled Reactive HiPIMS of Thermochromic VO2 Films at a Low Deposition Temperature (300 °C)
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High Power Impulse Plasma Magnetron Sputtering – Dawn of Industrialization
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Comparison of CrN from Planar and Rotating Target using Highly Ionized Processes
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Molybdenum Thin Films Deposited by High Power Impulse Magnetron Sputtering
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Epitaxial Growth of Copper Thin Films on Si(001) by HiPIMS
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