ICMCTF2013 Wednesday Morning

Environmental Barrier Coatings for Turbine Engines: Current Status and Future Directions

Y₂SiO₅ Coatings Fabricated by RF Magnetron Sputtering

Optimum Design of High Temperature Thermal Radiation Energy Reflection Coatings for SiC/SiC Components

Tridimensional Analysis of Interfacial Defects Consequences on Delamination of Thermal Barrier Coatings

Adsorption of Various REs Atoms on NiAl and Al2O3 Surface: An Implication for Grain Boundary Diffusion in Thermal Barrier Coatings

Microstructure and Thermal Oxidation Behavior of Yttria-Stabilized Hafnia Coatings

Tribocorrosion Mechanisms in Laser Deposited Titanium-based Smart Tribological Composite Smart Coating

Physical Vapor Partial Filtering for Chemical Composition Control in Hybrid PECVD / EB-PVD Process

A Multi Source PECVD Technology for Extremely Planar, Thick and Large-scale DLC Coatings

A Comparison on the Influence of Different Inert Gases for Reactive HiPIMS and DCMS CN_x Deposition Processes

Deposition and Characterization of Advanced DLC Coatings Deposited by Low Frequency Plasma Enhanced Chemical Vapour Deposition (LF PECVD)

State-of-the-Art of DLC Coatings: Industrial Deposition Methods and Tribological Applications 60 Years after the Discovery of DLC

Thermal Stability of DLC-MoS₂ Thin Films in Different Environments

Advanced PECVD Process Control through the use of RF and Plasma Key Parameters for Transfer of Layer Properties

High-rate Deposition of Dense Hydrogenated Amorphous Carbon Thin Films using High Power Impulse Magnetron Sputtering Based Process

Plasma Immersion Ion Deposition of Diamond-like Carbon Coatings on Inner Surface of Long Pipes for Industry Applications

Microstructural Investigation of Erosion Resistant TiN-TiAlN Laminated Coatings Deposited by Arc Ion Plating

Shake-up Features in Titanium Nitride Bilayer Systems used to Model Ultra-hard TiN/ Si₃N₄ Nanocomposites

Diamond Coatings’ Adhesion and Residual Stresses Assessment by Inclined Impact Tests

Study Of Structural and Mechanical Properties Of CrAlYN/CrY Multilayer Thin Film Deposited On M2 Steel

Growth of ZrO₂ by Heat Treating ZrN Thin Film in Vacuum

Structural and Elastic Properties of Ternary Metal Nitride Zr_1-xTa_xN Alloys Thin Films: Relationship with the Working Gas Pressure

High Temperature Tribological Properties of CrAlTiN Coating

On Hardness and its Benefit to the Characterization and Optimization of Coatings

Microstructure, Properties and Microtribological Performance of Magnetron-sputtered V-C Coatings

Adherent Amorphous Hydrogenated Carbon Coatings on Steel Surfaces Deposited by Enhanced Asymmetrical Bipolar Pulsed-DC PECVD Method and Hexane as Precursor

Nanoengineered Oxide and Nitride Thin Films with Unique Functionalities

Modeling Amorphous Materials from First Principles

Advanced Modelling of Amorphous Ceramics

Dynamics of Ti, N, and TiN_x (x = 1 - 3) Admolecule Transport on TiN(001) Islands and Surfaces

Ab Initio Study of the Effect of Al Addition on Surface Kinetics of Ti, Hf and Zr Nitrides

First-principles Study of Electronic, Elastic and Thermodynamic Properties of CrN

Importance of Finite Temperature Effects in AB INITIO Simulations of Materials for Hard Coating Applications

Fabrication and Characterizations of CIGS Films Using One-step Electrochemical Co-deposition Methods

Preparation of CdMnS Thin Film: Applications in Photoelectrochemical Cell

Fabrication and Characterization of High-efficiency CdTe-based Thin-Film Solar Cells

The Optimization of Indium Codoping Concentration in 100-nm-thick GZO Films for Low Resistivity and High Humidity Resistance Properties

Effects of Native Defects on the Electrical and Optical Properties of Cadmium Oxide

Study of the Instability of Amorphous InGaZnO Thin Film Transistor under the DC and AC Drain-bias Stress

Microwave-assisted Hydrothermal Synthesized Nitrogen-doped TiO₂ Photocatalysts for Enhanced Visible Light Response

Effect of Thermal Annealing on Nickel Oxide Doped AZO Transparent Conducting Thin Films Prepared by DC Magnetron Sputtering System

Characteristics of Plasma Generated by ICP-CVD with Various H2/SiH4 Ratios and the Resultant Properties of nc-Si-H Thin Films

Optoelectronic Characterization of p-type NiO_x and n-type TiO₂ Thin Films Deposited by Laser Ablation

Deformation and Fracture of Wear-Resistant Laser Oxide Coatings on Metallic Substrates

Influence of Film Thickness on Fragmentation and Contact Damage of Diamond-Like Carbon (DLC) Coated Titanium Substrates

Influence of Application Technology on the Erosion Resistance of DLC-Coatings

Elevated Temperature Nanoindentation of Multilayered Coatings

Energy Loss and Internal Frictions Study of Nanocrystalline Metal Thin Films

Effect of the Anisotropic Growth on the Fracture Toughness Measurements Obtained in the Fe₂B Layer

Characterising Micromechanical Deformation of Commercially Pure Zirconium

Super-hard or Super-tough? - Nanomechanics for Improving the Toughness and Durability of Hard Nanocomposite Films

Fatigue Property Improvements of Ti Alloys by Metallic Glass and TiN Thin Films

Microstructure and Properties Characterization of WC-Co HVOF Coatings Obtained From Standard, Superfine and Modified by Nanocarbides Feedstock Powders

Applications of HIPIMS Metal Oxides

Optical Coatings Prepared by HiPIMS – Does this Technology Meet our Expectations?

Epitaxial (001) Oriented Mo/V Superlattice Grown on MgO(100) by HiPIMS

High Power Impulse Magnetron Sputtering of Compound Targets

TiO₂ Coatings Deposited by Arc Free Deep Oscillation Magnetron Sputtering

Deposition Rate Enhancement in HiPIMS at Preserved Ionized Fraction of the Deposition Flux

Optimization of the Substrate Conditions by Monte Carlo Modeling of Sputtered Particle Transport

Temporal Characterization of Ion Dynamics in High Power Impulse Magnetron Plasma by Means of Plasma Monitor, Ridded Retarding Field Energy Analyzer and Modified Katsumata Probe

Mechanism of the Instabilities in HiPIMS Discharge and Correlation with Deposition Conditions

Influence of High Power Impulse Magnetron Sputtering (HIPIMS) Pulse Shape Regarding Voltage and Current Time Evolution on Plasma Characteristics, Deposition Rate and Ionization for Titanium Aluminum