ICMCTF2008 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Wednesday, April 30, 2008 | ||||||||||
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1:30 PM | 2:30 PM | 3:30 PM | 4:30 PM | ||||||||
A3-2 |
Cyclic Behavior of EB-PVD Thermal Barrier Coating Systems With Modified Bond Coat
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Damage Evolution and Spallation Mechanisms for APS-TBCs at Lower Temperatures
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Monitoring Delamination of Thermal Barrier Coatings by Near-Infrared and Upconversion Luminescence Imaging
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Recent Advances in Plasma Spray Process Control Towards Optimizing Compliance and Thermal Conductivity of Yttria Stabilized Zirconia Coatings
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Residual Stress in TGO on Different Bond Coats in TBC Systems
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Optical Measurement of the Thermal Diffusivity of Intact Thermal Barrier Coatings
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B5-2 |
Nano-Layered Hard Coatings: from Fundamentals to Applications
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Hardness of and Stress in Tungsten Carbide-Diamond Like Carbon Multilayer Coatings
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Heat Treatment Induced Phase Separation and Phase Transformation of Zr(N,O) Thin Films by Ion Plating
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Investigation of Atomic Layer Deposited Lubricous Nanocrystalline ZrO2 Thin Films and Their Interfaces by Spectroscopic Ellipsometry, X-ray Reflectivity, Grazing Incidence XRD and High Resolution TEM
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Tribological Studies on PVD/HVOF Duplex Coatings on Ti6Al4V Substrate
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Simulation of Molecular Dynamics Associated With Hardness of Metal/Metal Superlattice Thin Films
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Tribological and Corrosion Behaviour of NbN, a-Nb2O5 and Nb(O,N) Multilayer Coatings Deposited by Reactive Magnetron Sputtering
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Origin of Transformation-Induced Lateral Defects in Sputter Deposited Yttria-Stabilized Zirconia
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B7 |
Probing Atoms and Molecules in PVD Processes
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Langmuir Probe Measurements in a Radio Frequency (rf) Magnetron Plasma Used for the Deposition of Amorphous Silicon and Hydrogenated Amorphous Silicon
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Study of a Reliable Method for the Control of Reactive Magnetron Sputtering
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Analysis of Initial Conditions in Dynamic Berg’s Model
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D3-1 |
Defects in Graphene: Electronic Structure, Scattering Mechanisms, and Magnetism
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Elastic Properties of Cr2AlC Thin Films Probed by Nanoindentation and ab Initio Molecular Dynamics
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Solid Phase Reactions Between Al2O3 Substrates and TiC Thin Films Resulting in the Formation of the Ti2AlC MAX Phase
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Differences in Basal Plane Dislocation Motion in MAX-Phases
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Thin Film Synthesis and Characterization of M-Al-C (M=Cr, Nb, Ti, V) Compounds
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Formation of (Ti,Al)N/Ti2AlN Multilayers by Annealing of TiN/TiAl Multilayers
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E4/G4 |
Evaluation of Nanomechanical Test Approaches Towards PVD Coating Optimisation for High Speed Machining of Steel
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Cathodic Arc Ion Plated Cr2O3 Coating for Dry Cutting Tool Applications
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Surface Properties and Tool Performance of WC-Co Micro-Drill by Nitrogen Ion Implantation
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Successful Utilisation of Tribological Coatings for Green Manufacturing and Dry Machining
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Correlation of the Impact Resistance of CrAlN PVD Coatings With the Cutting Performance in Milling Aerospace Alloys
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Abrasiveness Properties Assessment of Coated Abrasives for Precision Belt Grinding
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Synthesis, Properties and Cutting Performance of the (Al,Cr)2O3 Coatings Produced by Cathodic Arc Evaporation
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G7 |
Characteristics of a New Filtered Pulse Cathodic Arc Source
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New Machine Concepts for Triple Coatings
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Recent Developments in Magnetron Sputtering
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Innovative Technologies and Processes as Approach to Novel Industrial PVD Coaters
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Recent Improvements in CVD-Diamond Deposition
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The Hauzer Flexicoat 850 Platform
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Innovative Equipment for the Production of PVD Oxide and Nitride Based Coatings for Industrial Tool Coating Production
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A Universal PVD Coater to Deposit W-DLC and C-DLC
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Aspects of Flexibility and Efficiency of Industrial Coating Machines
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H1-2 |
Electrical Contacts to Nanotubes and Nanowires
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Supercapacitive Properties of Spray Pyrolyzed Iron-Doped Manganese Oxide Powders Deposited by Electrophoretic Deposition Technique
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Study on Electrical Characterization of Nanostructured SrBi2Ta2O9 Functional Films
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Improved Grain Size of Polycrystalline Silicon Using Fluorine/Nitrogen Implantation Technology
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