ICMCTF1999 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Tuesday, April 13, 1999 | |||||||||||
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8:30 AM | 9:30 AM | 10:30 AM | 11:30 AM | |||||||||
A3 |
Relationships Between Bond Strength, Bond Stress and Spallation Mechanisms of Thermal Barrier Coatings
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Upper Temperature Limitation for the Functionality of Yttria Partially Stabilized ZrO2 for Thermal Barrier Coatings
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Developments in Materials and Manufacturing Technologies for Thermal Barrier Coatings Resulting From the Advanced Turbine Systems Program
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Thermophysical Properties of Thermal Barrier Coatings
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The Measurement of Strains Within the Bulk of Aged and As-Sprayed Thermal Barrier Coatings Using Synchrotron Radiation
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Physical Properties of Thermal Barrier Coatings Studied in Situ by High Temperature X-ray Diffraction
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Effects of Deposition Temperature and Thermal Cycling on Residual Stress State in Zirconia Based Thermal Barrier Coatings
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B2-2 |
Developments in Plasma Nitriding: Low Pressures and High Ion Energies
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Deposition of Tungsten Thin Films by Inductively Coupled Plasma Assisted CVD
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Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Alumina on Metallic Substrates
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Influence of Current Density and Gas Flow on the Growth of TiN in Different Sized PACVD Reactors and the OES Measurements
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New Coatings and PACVD Technology
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Deposition of Zirconia Thin Films by Inductively Coupled Plasma Assisted CVD
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Intensified Plasma-Assisted Nitriding of AISI 316 Stainless Steel
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Mo Ion Implantation as a Catalyst in the Diode and Triode Ion Nitriding of Al and Ti
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Ion Nitriding of Aluminum - the Influence of Oxygen on the Nitriding Kinetics
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Plasma Monitoring of Plasma Assisted Nitriding of Aluminium Alloys
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B3/F4 |
Recent Technologies and Advances in Thin Film and Coating Characterization Using Atomic Force Microscopy (AFM)
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Structure and Properties of Sputtered TiAl-M (M=Ag,Cr) Thin Films
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CrN Coating on Mild Steel with Modified Interlayer of Electroless Ni Plating
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Temperature Dependence of Thermal Expansion Coefficient and Bi-axial Modulus of Arc-ion Plated TiN, CrN, Cr2N and AlTiN Coatings.
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The Deposition of Compounds within the N,Ti Mixed Layer
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In-Situ STM Studies of the Evolution of Surface Morphology and Microstructure in Epitaxial TiN(001) Grown by Ultra-High-Vacuum Reactive Magnetron Sputtering
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Mechanical Behaviour of Nanostructured W-Si-N Sputtered Films
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Improvement of the Mechanical Performance of (W-C/N)-Based Coatings by Ti Addition
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Properties of Zirconium Oxide Thin Films Deposited by Pulsed Reactive Magnetron Sputtering
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C4-2 |
Development of Model-Based Process Control of Complex Thin Film Structures
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Physical Properties of Reactively Sputtered Aluminum Nitride
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Deriving the Kinetic Parameters for Pt-Silicide Formation From Temperature Ramped In Situ Ellipsometric Measurements
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Temperature Controlled Vacuum Arc Deposition
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Process Monitoring in Low-Temperature PECVD of Silicon Oxide Films by IR-RAS Method
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Space-Polymer Materials Degradation in Oxygen Plasma and Ultraviolet Light Studied by In-Situ and Ex-Situ Spectroscopic Ellipsometryn
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In-situ Spectroscopic Ellipsometry as a Surface Sensitive Tool to Probe Thin Film Growth
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D2-2 |
Effects of D.C. Bias Voltage on the Formation of Interfacial Layer of Diamond on Silicon by MPECVD Synthesis
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Formation of Intermetallic Cobalt-Phases in the Near Surface Region of Cemented Carbides
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Improvements in the Properties and Structure of Diamond Films Deposited by Pulsed Bias Enhanced Hot Filament Chemical Vapour Deposition
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Microwave Plasma Chemical Vapor Deposition of Diamond Films And Fabrication of Diamond Film for Micro Electro Mechanical Systems (MEMS)
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Mechanism of Intrinsic Stress Generation in High Quality CVD Diamond Films
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Low Temperature Selective Deposition of Diamond Film
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Comparison of FTIR-Emission Spectra From Diamond and Diamond-like Films
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High Rate Deposition of Diamond Like Carbon Film by Magnetically Enhanced Plasma CVD System
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The Structural and Emission Characteristics of Unhydrogenated Amorphous Carbon Film by Pulsed Laser Deposition
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Measurement of Elastic Properties of Diamond-like Carbon Films
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E5/D4 |
Tribological Properties of Nanocrystalline Diamond Films
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Preparation of Diamond Film by HFCVD of Camphor in Methyl Alchohol
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Friction and Wear Performance of Diamond-like Carbon Films Grown in Different Source Gas Plasmas
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The Role of CN Chemical Bonding on the Tribological Behavior of CNx Coatings
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Tribology and Surface Chemistry of Low Stress Hydrogen-Free Amorphous Diamond-Like Carbon*
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The Friction Characteristics of Hydrogen-free and Hydrogenated Hard Carbon Films in Dry and Humid Atmospheres
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Effects of Direct Current and Pulse-Plating on the Co-Deposition of Nickel and Nanometer-Diamond Powder Coatings
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Fine Polishing of Diamond Film Via a Thinning Process Using Fe, Ni, Cr Alloys and a Dry Grinding Process Using a Synthetic Diamond Powder
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G2 |
Commercialization Barriers for Engineered Surfaces: Opportunities in the Advanced Technology Program
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Scale-up of Pulsed Laser Deposition - Is it Ready?
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Applicability of Different Hard Coatings in Dry Machining an Austenitic Steel
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Extended Application Ranges by New Hard/Lubricant Tool Coating
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High Volume PVD Coating of Precision Components of Large Volumes at Low Process Costs
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Technology Insertion: Replacement of Electroplated Chromium With HVOF Thermal Spray Coatings in Manufacturing and Maintenance of Military Aircraft
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Commercialization of Ion Beam Deposition Systems for Multilayer Coatings and Diamond-like Carbon Deposition
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Diamond-like Carbon Coatings Prepared in a Bipolar Pulsed D.C. Plasma
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H2 |
Deposition, Microstructure and Abrasive Wear Behavior of Al-Cu-Fe Quasicrystalline Coatings
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Surface Energy of Al-Cu-Fe Intermetallics
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Microstructure and Tribological Behaviour of (Al-Cu-Fe) Based Quasicrystalline Films Deposited by Means of Magnetron Sputtering
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Potential Applications of Quasicrystalline Coatings and Thin Films
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Interesting Properties of Films Composed of Very Small Grains Formed From a High-Rate Nanoparticle Beam
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