AVS2008 Friday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Friday, October 24, 2008 | ||||||||||
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8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
BO+ |
Photo-Patterned SAMs on Au(111) and SiOx: An XPS Investigation
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Odd-Even Efect in Molecular Packing and Stability of ω-Biphenyl-Alkane-Selenol SAMs on Au(111)
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Self-Assembly of Methanethiol on the Reconstructed Au(111) Surface
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Thermo Scientific Theta Probe : Measuring the Quality of Self-Assembled Monlayers on Gold
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Morphology and Bonding in Alkene and Alkyne Based Monolayers Chemomechanically Formed on Si Surfaces
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NS+ |
Synthesis of Controlled (/n,m/) Identity Single-Walled Carbon Nanotubes
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Fullerene Growth on N-adsorbed Cu(001) Nanopatterned Surfaces
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Nanochemical Equilibrium Involving a Small Number of Molecules: a Prediction of a Distinct Confinement Effect
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Epitaxial Growth of InP Nanowires on Silicon
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Structure and Electron Transport within Self-Assembled Monolayers (SAMs) of Discotic Molecules on Au-substrates
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Nanoscale Ballistic Heat Conduction in Silicon
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Understanding the Factors Driving Performance and Reproducibility for Spray-Coated Single Wall Carbon Nanotube Transparent Conductive Films
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Electron Beam Irradiation Induced Mass Transport in Indium Filled Indium Oxide Tubular Nanoarrow Structures
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Etch Stop Control and Low-Damage Atomic-Layer Etching of HfO22 using BCl3 and Ar Neutral Beam
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Assessment and Characterization of Exposures to Airborne Nanoparticles at Research Centers
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PS1-FrM |
Effect of Annealing Temperature on the Response of HfO2 to Vacuum Ultraviolet Radiation
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Response of BEOL Dielectrics to VUV Radiation
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Mechanism of Plasma Ashing Damages on Porous SiOCH Films
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Surface Modifications of Ultralow Dielectric Constant Materials Exposed to Plasmas under Sidewall-like Conditions
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Degradation Mechanisms of Structure and k Value of Low-k Film by Plasma Irradiation
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Study of SiOxFy Passivation Layer Deposited in SiF4/O2 ICP Discharge used in Cryogenic Alternated Etching Processes
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Anisotropic Fluorocarbon Plasma Etching of Si/SiGe Heterostructures and Induced Sidewall Damage
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Influences of Electrical Characteristics in Carbon Nanotubes by Neutral Beam Irradiation
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Surface Modification of PTFE Surfaces with Post-Discharge RF Plasmas Operating at Low and Atmospheric Pressure
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CoSix Damage in Etching and Ashing Plasma
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PS2-FrM |
Silicon Oxide Sidewall Passivation during HBr Inductively Coupled Plasma (ICP) Etching of InP and GaAs Materials for the Fabrication of Photonic Devices
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Low Bias Inductively Coupled Plasma Etching of CdHgTe in CH4/H2 Based Chemistry
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Characterisation of InP Ridge Sidewalls Patterned in Inductively Coupled Halogen Plasmas
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The Plasma Polymerization of Novel Metal Containing Monomers Via Sublimation of the Precursor Materials
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Advancement and Characterization of 3D TSV Etch Applications
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Investigation of Bottom Profile Degradation Mechanism in Extremely High-Aspect-Ratio Feature Etching
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Through Silicon Via Etching for 3-D Interconnection using Pulse Inductively Coupled Plasma
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SE+ |
On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
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Deposition of Metal Oxide Coatings using Reactive High Power Impulse Magnetron Sputtering
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A Mass/Energy Analysis of the Plasma during Modulated Pulse Power Sputtering
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Process, Structure and Properties of Chromium and Chromium Nitride Coatings Synthesized using Modulated Pulse Power (MPP) Sputtering
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Deposition Rate of High-Power-Pulse Magnetron Sputtering Processes
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Effects on Thin Film Growth Due to Anomalous Transport in High Power Impulse Magnetron Sputtering
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High Power Impulse Magnetron Sputtering of Ti-Si-C Multifunctional Thin Films
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Modulated Pulse Power Deposition of Aluminum Oxide Nanometer Scale Multilayer Films
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The Specification and Optimization of HIPIMS Power Supply Parameters
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SS+ |
Heterogeneous Reactivity of O3 and OH Radical with Potassium Iodide
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Reactivity of Fe0 Atoms, Clusters and Nanoparticles with CCl4 Multilayers on FeO(111)
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New Paradigms for Environmental Surfaces: Structure and Reductive Transformation at α-Fe2O3/Water Interfaces
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Molecular Beam Studies of Supercooled Mixtures of Methanol and Water
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DFT Study of Water Adsorption on SrTiO3 (001) Bulk Termination and 2x1 Reconstruction
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Unraveling a Reaction on an Oxide Surface Step by Step: Formation of Water from Oxygen through Successive H Transfer Reactions on TiO2(110)
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Water Dissociation on Single Crystalline Anatase TiO2(001) Studied by Core Level Photoelectron Spectroscopy
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Study of the Oxidation of Titanium and the Adsorption of Biomolecules on Titanium by Means of Electrochemical Quartz Crystal Microbalance with Dissipation Supported by X-ray Photoelectron Spectroscopy
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Acidic Dissolution Mechanism, pH-dependent Stabilization and Adhesion of Single Molecules on Single Crystalline ZnO(0001)-Zn Model Surfaces Studied by in-situ AFM and DFT Simulations
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The Adsorption of Water on a PdO(101) Thin Film on Pd(111)
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SS+ |
From Nanochemistry to Active Nano-Objects at Semiconductor Surfaces
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Chemistry of the Si-rich β-SiC(100) Surface Compared to the Si(100) Surface
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Surface Band Bending in GaN
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An Accelerated Molecular Dynamics Study of Diffusion on the GaAs (001) β2(2x4) Reconstruction
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First Principles Investigation of Dimer Ordering on III-V Semiconductor Surfaces
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Hydroxyl Termination and Passivation of the Group III-rich (4x2)/c(8x2) Surfaces of InAs(001) and InGaAs(001) Surface Studied by STM, STS, and DFT
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Pit Nucleation in the Presence of (nx3) and β2(2x4) Surface Reconstructions on In.81Ga.19As/InP Films
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In-situ ALD Studies of Al- and La-oxide on In0.53Ga0.47As
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Atomic Scale Investigation of Mn Impurities on the InAs(110) Surface
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