AVS2000 Tuesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Tuesday, October 3, 2000 | ||||||||||
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2:00 PM | 3:00 PM | 4:00 PM | 5:00 PM | ||||||||
BI+ |
Model Surfaces for Studying and Controlling the Adhesion of Cells
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Cell Respone to Chemically and Topographically Modified Surfaces
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Directing Endothelial Cell Attachment and Growth Using a Novel Ozone Patterning Technique
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Cellular Interactions with Self-assembled Monolayers
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Artificial Networks of Rat Hippocampal Neurons on Microelectrode Arrays
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Living Neural Cells as Components in Sensors and Computational Devices
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Tissue Formation of Hepatocytes on Micro-Porous Films of Polylactide
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EL+ |
Nano-switches Using Vacuum Nano-electronics and Superconducting Weak Links
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Persistent-current Qubits for Quantum Computation
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Coulomb Blockade Devices Fabricated by AFM-manipulation of Nanoparticles
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A Novel Scheme for the Fabrication of Ultra-short Metal-oxide-semiconductor Field-effect Transistors
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Quantitative Analysis of Charge Injection and Discharging of Si Nanocrystals and Arrays by Electrostatic Force Microscopy
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Quantized Conductance in AuPd Alloy Nanocontacts
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Bistability in Conductance of Point Contact formed between a Metal Tip and Ga-terminated Si(111)
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Analysis of Non-linear Behaviour in Gold Nanowires
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FP+ |
Development and Characterization of Cu-Li Alloy Edge Field Emission Devices1
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Field Emission Characteristics of Carbon Nanotubes
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Current Density Saturation in FED Phosphors
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Cathodoluminescence from Thin Film versus Powder Phosphors
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Reliability of Silicon-based Field Emission Displays
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Illumination Sources for Laser-based Displays
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Oxide Phosphor TFEL Devices Fabricated by Magnetron Sputtering with RTA
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IE-TuA |
Challenges in Bringing Green Manufacturing Technologies to the Clean Room Floor
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Eliminating Perfluorocompound Gas Emissions from CVD Chamber Cleans
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Meeting IBM's PFC Emission Goals: Using the IBM In Situ Dilute NF3/He Plasma Clean in Production on the Applied Materials 200 mm P5000 Lamp-Heated CVD Toolset
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Treatment of Wastes from Chemical Mechanical Polishing Operations
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Advanced Chemicals for Semiconductor Processing
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High Throughput Process for Photoresist Stripping and Residual Polymer Removal in a Via Post-Etch Process
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MC-TuA |
Molecular Secondary Particle Emission from UHV-Prepared Molecular Overlayers
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Detection of Trace Metal Contamination on Si Wafers by TOF-SIMS
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Comparative Ion Yields by Secondary Ion Mass Spectrometry from Microelectronic Films
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Quantitative Surface Analysis Using Ion Implantation
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Comparison of ISS, XPS, and QUASES-XPS Techniques for Determination of Growth Mechanisms: Application to Thin Iron Oxide Films Deposited on SiO2
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Quantitative Depth Profiling with Angle Resolved XPS: The Effect of Surface Roughness
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Intercomparison of IMFPs Determined by Elastic Peak Electron Spectroscopy
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Measurement of Silicon Dioxide Film Thicknesses by XPS
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A New Angle on Angle Dependent XPS
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MI+ |
Correlation of Ferromagnetic and Antiferromagnetic Spin Orientation Observed by Photoemission Electron Microscopy
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Magnetic Imaging of NiO/Ag(001) Thin Film using PhotoEmission Electron Microscope
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Magnetic Imaging by Local Tunneling Magnetoresistance - A High Resolution Technique
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Self-assembled Magnetic Nanowires Studied with Spin-polarized Scanning Tunneling Microscopy
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Direct Visualization of Magnetic Nanowires by Spin-Polarized Scanning Tunneling Spectroscopy
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Real-Space Imaging of Two-Dimensional Antiferromagnetism on the Atomic Scale
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Ballistic Electron Magnetic Microscopy Studies of Ferromagnetic Films and Tunnel Junctions
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NS+ |
Dip-Pen Nanolithography: A New Tool for Generating and Studying Soft Nanostructures
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A Step Toward Making and Wiring-up Molecular-Scale Devices with a Self-Directed Growth Process
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Control of Spatial Distribution of Self-Assembled Diacetylene Compounds by Co-deposition with Fatty Acid Molecules
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The Interaction of Metal Atoms with Self-assembled Organic Monolayers
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Chiral Surface Reconstruction by Largish Molecules
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From Functionalisation of Single Molecules to Self-organisation of Nano-structured Thin Films
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Ion Beam Assisted Self-Organization of Periodic Nanowire-Arrays on CaF2 Substrates
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Quantum Engineering of a Pb Nanostructure: Controlling the Thickness with Monolayer Precision
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PH-TuA |
From Integrated Optics to MOEMS at LETI , the Key Role of Plasma Processes
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Optical Properties of Tantalum Oxide Films Produced by High Density Plasma Enhanced Chemical Vapor Deposition
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Processing of (Pb,La)(Zr,Ti)O3 Waveguide Devices on Nb-doped SrTiO3 by Solid-phase Epitaxy
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Comparison of Dry and Wet Etch Processes for SiO2/TiO2 Distributed Bragg Reflectors for Vertical Cavity Surface Emitting Lasers
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Advances in Materials and Design of Optical Amplifiers
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A Roadmap for Integrated Microphotonics
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PS2-TuA |
Effect of Xenon Dilution on Fluorocarbon Plasma Chemistry and Electron Distribution Function
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Comprehensive Measurements of Neutral and Ion Number Densities, Neutral Temperature, and EEDF in a CF4 ICP
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Planar Laser-Induced Fluorescence Investigation of Fluorocarbon Plasmas
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Determination of Electron Temperature, Fluorine Concentration, and Gas Temperature in Fluorocarbon/Argon Plasmas using Optical Emission Spectroscopy
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Time-Resolved Measurements of Fluorocarbon Radical Concentrations during Pulsed Oxide Etching Plasmas
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Development of an Instrument: Resonantly Enhanced Multiphoton Ionization of Radicals Detected Using Time of Flight Mass Spectrometry
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Temperature and Distance Dependencies of Fluorocarbon Species Desorbed from Polymer Deposited Metal Surface in C4F8 Inductively Coupled Plasma
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CxHy Radical Measurements using Cavity Ring Down Spectroscopy in a Remote Ar/C2H2 Plasma
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Electron Energy Control in Large-Diameter Inductively Coupled Plasma for High Performance of Etching
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SC+ |
Novel Reactions of Organic Molecules for Controlled Modification of Semiconductor Surfaces
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Peter Mark Memorial Award Address
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Structure of Cyclopentene Adsorbed on InP (001)-(2x1) Surface
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Formation and Reaction of Organic Layers on Germanium: Reaction of 1,5-cyclooctadiene with the Ge(100) Surface
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A Comparative Study of the Bonding of N-Containing Heterocyclic Molecules to the Si(001) Surface
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Reaction of Pyrrole and Pyrrole Derivatives on Si(100)-2x1
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Attaching Aromatic Molecules to the Si(001) Surface via Oxygen and Sulfur Tethers
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Chemical Reactions on the Diamond(100) Surface: First-principles Theory and Comparisons to Experiment
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SE-TuA |
Surface Engineering by Plasma Immersion Ion Processing
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The Surface Modification of Wear Resistant HSS Cutting Tools with Adapting Engineered Coatings
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Enhanced Passivity of Austenitic AISI 304 Stainless Steel by Low-Temperature Ion Nitriding
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CVD Diamond Nucleation under Extreme Conditions
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Large-area Nitrogen-doped SiO2 Films Deposition in a Large-scale Integrated RF PSII/PVD System
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Cleaning, Etching and Oxidation of W films for Microelectronics Applications
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Reactions of Fluorocarbon Polyatomic Ions with Polymer Surfaces
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An Aging Study of Fluorocarbon Plasma Polymers Deposited on Si-C Plasma Polymer Films Using XPS
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An XPS Investigation into the Role of Oxygen in the Structural Formation of Methylated Silane Plasma Polymers
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SS1-TuA |
Bestowing Chirality: The Ultimate Control of a Surface Reaction
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Artificial Control of Catalytic Functions for Reaction Selectivity by Thickness-extensional Mode Resonance Oscillation of Acoustic Wave
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Surface Science Models of Sulfided NiW, CoW, NiMo and CoMo Hydrodesulfurization Catalysts
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Chemistry of Thiophene, H2S, and SO2 on Carbide-Modified Mo(110) and Mo2C Powders
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Selective Surface Reactions of Single Crystal Metal Carbides: Alkene Production from Short Chain Alcohols on Titanium Carbide and Vanadium Carbide
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Alkylidenes on Molybdenum Carbide; Stable Carbenes on the Surface of a Catalytically Active Material
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Radical Rearrangement as a Probe of Partial Oxidation Mechanisms: Reaction of (Bromomethyl)cyclopropane on Oxygen-Covered Mo(110)
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Reaction Kinetics on Supported Model Catalysts: A Molecular Beam / In-Situ IRAS Study of the CO Oxidation on Pd/Al2O3
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Dissociative Chemisorption of Chloromethanes on Ir(110), Ir(111) and Oxygen Modified Ir(111)
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SS2-TuA |
Ultra-Fast Dynamics Measurements of One- and Two-Dimensional Surface State Electrons on Stepped Cu(775)
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Electron-Stimulated Oxidation of Al(111)
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Ion-Influenced Nucleation and Surface Diffusion: A Computational Study
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Surface Modification of CaF2 for Improved Heteroepitaxy
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Consequences of Electron Irradiation of Hydrated Crystals: Self Organized Nanometer Cone Formation
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Femtosecond Measurements of Surface-State-Electron Dynamics on Nanostructured Ni Surfaces
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Theory of Single Molecule Vibrational Spectroscopy and Microscopy
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Transient Currents as a Tribological Probe
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SS3-TuA |
Alumina-Water Interactions from First Principles
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The Effect of Boron on Water Dissociation and Surface Diffusion of Atomic Hydrogen on Single Crystal Ni3(Al, Ti) (110)
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Physicochemical Properties of Water and Ammonia Ice Thin Films
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Water Ion Cluster Formation in High Electric Fields at and Near a Pt Emitter Tip
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Interactions of Methanol with Water and Hydrogen in Electrolytic Adlayers on Pt(111)
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From Gases to Dust: Ice Chemistry in the Interstellar Environment
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Diffusion of Organic Molecules in Ice Measured Using Laser Resonant Desorption Depth-Profiling
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Can Clustering Lower the Barrier to Dissociation of Water on Nickel Surfaces?
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Surface and Near Surface Reactions in Aqueous Solution Exposed Na2O-Al2O3-SiO2 Glasses
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TF-TuA |
The Nanomechanical Properties of Thin Films
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Anomalous Plastic and Elastic Behaviors of Sputter-deposited TiN with 10 or 20 Inserted Thin Al Layers Evaluated by Nanoindentation
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Tungsten Silicide (WSi2) for the Alternate Gate Metal in Metal-Oxide-Semiconductor (MOS) Devices
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Structural and Mechanical Properties of TiC/Ti and TiC/B4C Multilayers Deposited by Pulsed Laser Deposition
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Structural Studies of AlN Thin Films during Low Temperature RF Sputter Deposition
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Multifunctional Ceramic Films
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Quantification of Scratch Resistance and Accelerated Wear for Thin Film Coatings Using the Newly Developed Micro-Tribometer and Testing Procedure
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Lubricating Characteristics of Zinc Oxide: Effect of Carbon, Silicon and Boron as Additives
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