AVS1998 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Wednesday, November 4, 1998 | ||||||||||
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2:00 PM | 3:00 PM | 4:00 PM | 5:00 PM | ||||||||
AS-WeA |
Changes in the Band Structure Across the Surface Ferroelectric Phase Transition in the Crystalline Ferroelectric Copolymer P(VDF-TrFE)
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UV Photopolymerization of Methyl Methacrylate and Acrylic Acid on Pt(110) Using Time-Resolved FT-IRAS
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Correlations of the Structure and Mechanical Properties of Polymer Surfaces: Combined Sum Frequency Generation-Surface Vibrational Spectroscopy and Atomic Force Microscopy Studies
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Hydrolysis Degradation of Biodegradable Polymers A Time-of-Flight Secondary Ion Mass Spectrometry Study
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Effect of PDMS Segment Length on the Surface Composition of Polyimidesiloxane Copolymers and its Role in Adhesion
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Interface Characterization with Combined XPS and TOF-SIMS An Application to the Metallization of Plasma Modified Polymer Surfaces
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XPS Evidence of Redox Chemistry Between Cold Rolled Steel and Polyaniline
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Evaluation of the Degradation Mechanism(s) Associated with Acid Rain Exposure of Acrylic Melamine Based Automotive Clearcoats
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Optical Characterization of FEP Teflon: Pristine and from Hubble Space Telescope1
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EM1-WeA |
Understanding the Evolution of Surface Morphology during Chemical Etching
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Structure of a Passivated Ge Surface Prepared from Aqueous Solution
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Reflectance Difference Spectroscopy of Ge / Si(001)
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Second Harmonic Study of Ge/Si(100) and Si1-xGex(100) Films
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Silicon Epoxide: Fundamental Intermediate in Si(100) Oxidation
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Structure of Ultrathin Silicon Oxide - Silicon Interfaces Studied by Ultraviolet Photoelectron Spectroscopy
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Influence of Rapid Thermal Annealing on Vicinal Si(111)/SiO2 Interfaces Investigated by Optical Second Harmonic Generation.
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The Initial Stages of Si(100) Oxynitridation by NO: An Infrared Study
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Growth and Analyses of Silicon Nitride Thin Films on Si(111) and Si(100)
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EM2-WeA |
Oscillating Contrasts Surrounding Charged Defects and Dopant Atoms in (110) Surfaces of III-V Semiconductor at Room-Temperature
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Two-Dimensional Carrier Profiling of III-V Structures using Scanning Spreading Resistance Microscopy
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The Structure of InAs/AlSb/InAs Surfaces and Interfaces Grown by MBE
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In-Situ STM of MBE Growth Quality for GaAs(001) and InP(001)*
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Structural and Morphological Studies of GaN Heteroepitaxy on SiC(0001)
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Impact of Deposition Method on the Microstructural and Electrical Properties of Thin Film Silica Aerogels
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UHV STM Nanofabrication and the Giant Deuterium Isotope Effect: Applications to CMOS Technology
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Scanning Probe Microscopy Imaging of IC Cross Sections
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Silicon Nitride Islands as Oxidation Masks for the Formation of Silicon Nano-Pillars
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MI+ |
Using the Magnetic Force Microscope as a Quantitative Micromagnetic Probe
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Imaging Current Flow in Polycrystalline Bi2Sr2CaCu2Ox Superconductors by Magnetic Force Microscopy
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Imaging Magnetic Domains by Spin-Polarized Scanning Tunneling Spectroscopy
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Imaging Magnetization in Fe and Layered Fe/Co Films Using an Element-Specific Scanning Transmission X-Ray Microscope
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Substrate and Growth Related Nanostructural and Magnetic Properties in La0.67√sub 0.33MnO3 Thin Films
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Monodisperse Cobalt Nanocrystals and Their Assembly into Nanocrystal Superlattices: Building with Magnetic Artificial Atoms
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Fabrication and Characterisation of Micron Scale Magnetic Features
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Domain Behavior in Magnetic Nanostructures as Revealed by MOIF Observations
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MS-WeA |
Factory Implementation of Process Control: Technical or Cultural Challenge?
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Advanced Process Control and Sensor Requirements for Reducing Non-Product Wafer Usage and to Increase Tool OEE in 300mm Manufacturing
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Process Module Control Technology for 300mm Plasma Processing
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Using Wafermap Data for Automated Yield Analysis1
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Visual Data Mining of Defectivity Data using Parallel Coordinates
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PS-WeA |
Surface Reactions and Hydrogen Coverage on Plasma Deposited Hydrogenated Amorphous Silicon and Nanocrystalline Silicon Surfaces
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Gas Phase and Surface Kinetics in Plasma Enhanced Deposition of Silicon Nitride: Effect of Gas Dilution on Electron Energy Distribution, Radical Generation, and Film Composition
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Atomistic Simulation of Plasma Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films
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The Ion-assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine: Experiment, Modeling, and Simulation
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The Role of Etching Products on the Chemical Composition and Thickness of the Chlorinated Surface Layer That Forms During Etching of Silicon in a Chlorine Plasma
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Reactive Ion Etching of Si by Cl, Cl2, and Ar Ions: Molecular Dynamics Simulations with Comparisons to Experiment
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Investigation of Si-poly Etch Process for 0.1 µm Gate Patterning and Beyond
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Mechansims in High Aspect Ratio Oxide Feature Etching using Inductively Coupled Fluorocarbon Plasmas
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Surface Reactivity of CF and CF2 Radicals Measured Using Laser-Induced Fluorescence and CHF3 Plasma Molecular Beams
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Optical Monitoring of Surface Adlayers by Laser-induced Thermal Desorption during Plasma Etching of Si and Ge
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SE-WeA |
UHV Arcjet Atomic Nitrogen Source: Beam Characterization and GaN Epitaxial Growth
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Flow Characteristics of a UHV Nitrogen Arcjet
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Gas-Phase Diagnostics for Wide Bandgap Semiconductor Development
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Fast Deposition of Amorphous Hydrogenated Silicon and Carbon
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Inexpensive Corona Discharge Source for the Growth of III-N Semiconductors
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Development of Atomic Nitrogen Sources and Atomic Nitridation Processes
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Energetic Oxygen Atom Surface Passivation of Cd1-xZnxTe Radiation Detectors
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The Atmospheric-Pressure Plasma Jet: Properties and Materials Applications
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SS1-WeA |
Quantifying Surface Electromigration: Si(111) as a Model System1
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Electromigration and Cluster Motion1
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Theory of Surface Electromigration on Metals
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Theory of Surface Electromigration on Stepped and Islanded Surfaces.
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Surface Electromigration Processes on Gold and Copper Films
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Molecular Dynamics Studies of Interlayer Mass Transport and Dendritic-to-Compact Morphological Transitions during Submonolayer Growth on Pt(111) Surfaces
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Edge Barriers and Mass Transport on Metal (100) Surfaces1
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Metal Row Growth on a High-Index Silicon Surface
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One Dimensional Growth Behavior of Xe Atoms on Step Edges of Cu(111)
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SS2-WeA |
Photochemical Routes to Group IV Deposition
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Electron Induced Deposition of Germanium on Si(100): TPD, XPS, and HREELS Study
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Photodesorption of Condensed Gases by Lyman-α
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Photodesorption of Positive Ions from Oxyanion-Containing Inorganic Crystals
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Direct Observation of Synchrotron-Radiation-Stimulated Decomposition of SiO2 Thin Films on Si(111) Surfaces using Scanning Tunneling Microscopy
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Surface Decomposition Reaction of Trisdimethylaminoantimony on GaSb(100)-(3x1)
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Interaction of Ethylene with the Ge(100)-2x1 Surface: Coverage and Time-Dependent Behavior
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Interaction of Amines with Hydrogen on Al(111)
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Adsorption and Reaction of Chlorine on Low Index Diamond Single Crystal Surfaces
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Desorption Kinetics of Hydrogen and Deuterium from Diamond (111)x(1x1) via Helium Atom Scattering
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TF-WeA |
Preferential Sputtering Effects in Thin Film Processing
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Measurements and Modeling of Ti and Ta Sputtering as a Function of Target Microstructure and Temperature
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Reactor-Scale Models for Rf-Diode Sputtering for GMR Thin-Film Growth
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Using Pulsed DC Power for Reactive Sputtering of Al2O3
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Suppression of Hillocks and Whiskers on Al Films Deposited onto a Glass
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Substrate Bombardment and Heating in Dual Magnetron Sputtering Using Mid-Frequency AC
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A Novel Approach to Collimated Physical Vapor Deposition
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Microcrystalline Silicon Thin Films Deposited By Low Temperature Reactive Magnetron Sputtering: The Effect Of Using Deuterium vs. Hydrogen
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Atomistic Simulations of the Sputter Deposition of Copper
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VT-WeA |
Design and Installation of a Low Particulate, Ultra-High Vacuum System for a High Power Free Electron Laser
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Vacuum Instrumentation and Control System for the Relativistic Heavy Ion Collider
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An Ultra-High Vacuum System for Hydriding Rare Earth Metal Films
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Thermal Stability and Sealing Performance of Perfluoroelastomer Seals as a Function of Crosslinking Chemistry
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Vacuum Insulation, 100 years of Cryogenics, and Clean Ultra High Vacuum
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Method for Measuring Deuterium in Erbium Deuteride Films
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Characterization of Aluminum Materials Focusing Electron Stimulated Gas Desorption and Its Surface Analysis in Surface Treatment Techniques
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