AVS1997 Wednesday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, October 22, 1997
2:00 PM 3:00 PM 4:00 PM 5:00 PM
AS-WeA
Radiation Damage in Zirconium Oxide
Ion Scattering Studies of Epitaxially Grown Iron Oxide Films on MgO and Al2O3 Substrates
Valence Band X-Ray Photoemission Investigation of Surface Cleanliness of Aluminum Metal and its Alloys.
The Valence Region in Photoelectron Spectroscopy: A New Approach to Chemical Information for Non Conductive Systems
Self Texture in the Initial Stages of Zinc Oxide Film Growth
Surface Structure and Dynamycs of KTaO3 by Helium Atom Scattering.
SIMS Measurements of Mobile Ion Concentration Depth Profile in Insulating Layers
High Resolution XPS Investigations of the Interactions of a Resole Phenolic Resin Matrix with Silanised E-glass Surfaces
Surface Characterization of Passivation Films on Aluminum
BI-WeA
The Neuron-Silicon Junction and Beyond.
Reagentless Biosensors Based on Molecular Recognition and Transduction at Self-Assembled Monolayers
Reversible Blocking of Ligand Binding to Streptavidin with Stimuli-Responsive Polymers.
A New Method for Patterning Antibodies onto a Surface
Grafting Polyethylene Glycol on Surfaces to Create Biocompatible Coatings
Diffusion in Microfluidic Systems
Stabilization of Self-Assembled Monolayers on Glass and Silicon
In situ Two-Color Surface Plasmon Resonance Spectroscopy of Biopolymer Film Formation at Solid/Liquid Interfaces
EM+
Light Emitters Based on Organic Thin Films Deposited in Vacuum
Enhancing the Brightness, Efficiency and Color Purity in Organic Electroluminescent Devices with Al Cathode.
New Developments in the Photonic Applications of Conjugated Polymers
Recent Progress of Organic Electroluminescent Materials and Devices
Conjugated Oligothiophenes, a New Class of Organic Semiconductors and Laser Crystals
High-Mobiilty and Liquid-Phase-Processable Organic TFT Semiconductors
Analysis of a Nanoscopic Field Effect Transistor based on Metallization of a Molecular Layer
Photoemission Spectroscopy Analysis and Organic Light Emitting Material*
MI+
Sigma's and Cpk's - Process Challenges in Thin-Film Disk Technology
Interfacial Interactions of Perfluoropolyether Lubricants with Amorphous Carbon Surfaces
Processing Issues in Magnetic Recording Technology
Development of ECR and ICP High Density Plasma Etching for Patterning of NiFe and NiFeCo
Reactive Plasma Etching of Magnetic Head Materials
Macromagnetic Properties of CoPt12Cr13 Thin Films
Thin-Film, Extreme-High Vacuum System
MM+
Antistiction Processes in Surface Micromachines
Friction and Durability of Silicon Surfaces Treated with Silane-Based Coupling Agents1
Diamond Surface Modification for MEMS
Contact Resistance Performance of Electrostatically Actuated Microswitches
Advances in Systems Integration
Electroosmotic and Electrophoretic Integrated Fluidics
A Micromachined Differential Scanning Calorimeter
NS-WeA
Temperature Controlled INCISIVE Tips on Piezoresistive Atomic-Force-Microscope Cantilevers
Nano-Mechanical Structures in Single Crystal Silicon
Using Nanoscale Science with Micromechanics as Ultimate Limit Sensors
Design, Fabrication and Testing of a Wafer-Scale Manufactured Tunneling Infrared Sensor.
PS-WeA
High Density Plasma Oxide Etching: Expectations Versus Reality
Photoresist Erosion Characteristics in Low Pressure, High Density Plasmas used for Selective Etching of Silicon Dioxide
Oxide Etch Rate and Photoresist Selectivity in a High Density, Inductively Coupled Plasma Reactor
Aspect Ratio Independent Etching of Dielectrics
Chemical Topography of Selfaligned Contact Structures Etched in a Magnetically Enhanced Reactive Ion Etching System using C4F8/CO Gas Mixtures.
Selectivity Change in Self Aligned Contact Ethcing
Contact Etch Scaling with Contact Dimension
Mechanistic Studies of Highly Selective Etching of Silicon Dioxide Over Silicon Nitride in Inductively Coupled Fluorocarbon Plasmas
Flow Rate Rule for High Aspect Ratio SiO2 Hole Etching
SS-WeA
Resonant Photoelectron Spectroscopy of K-intercalated MoS2
The Cs/MoS2(0002) Electron Donor-Acceptor Complex: Element-, Orbital- and Site Specific Information Obtained by High Resolution X-ray Photoemission Spectroscopy
Theory of Silica Surfaces and Processes
New Method for the Observation of Interface States: XPS Measurements under Biases
Surface Metallic Behaviour in Icosahedral Quasicrystals
Thickness Dependence of Work Function for Pd/Cu(111) and Au/Cu(111) Studied by STM
Fermi Surface and Electronic Structure of a Surface Charge-Density-Wave: Pb/Ge(111)
Novel Electronic and Magnetic Properties of Ultra-thin Chromium Oxide Films Grown on Pt(111)
Molecular Adsorption and Defect Creation on Thin Metal Oxide Films Studied with MIES and UPS(HeI)
SS1-WeA
Synthesis of Ammonia over a Ruthenium Single Crystal
The Catalytic Chemistry of Small Hydrocarbons on Palladium and Oxygen-Modified Molybdenum.
Mechanism and Kinetics of Methanol Synthesis over a Zn-promoted Cu(111) Surface
CO Oxidation Over Model Au/TiO2 Catalysts
Realistic Surface Science Models of Industrial Catalysts
Nanofabrication of Model Catalysts
Preparation of Supported Nanoparticles on Thin Oxide Substrates.
Reaction-induced Surface and Structural Changes in Perovskite Catalysts for Oxidative Dehydrogenation of Alkanes
Synthesis and Characterization of Nickel Sulfide Catalysts
SS2-WeA
Accurate Cluster-Based Methods of Modeling Photoelectron Diffraction Data: Comparisons and Applications to Adsorption and Epitaxial Growth
Interaction of Se with Si(111): A Photoelectron Diffraction Study
Atomic Structural Model of Ga:Si(112): Theory and Experiment
Alkali Metal Adsorption on Cleaved Si(111): A LEED and Photoemission Study of New Surface Phases
Magnetic Surface-Alloy Structure Determination by Photoelectron Holography, Surface X-ray Diffraction, and Quantitative Photoelectron Diffraction
Photoelectron Diffraction as a Contrast Mechanism and a Crystallographically-Sensitive Tool in Electron Microscopy
Genetic Algorithms and Parallel Computing for the Global Search in Complex Surface Structure Determination by LEED
Adsorption Structures on Co(0001)
TF1-WeA
New Observations on the Effect of HF Exposure on the Mechanical Properties of Polysilicon Thin Films
Synthesis and Characterization of BN and BCN Thin Films
A Hardness Enhancement by Compositionally Modulated Structure of TiN/Ti Multilayer Films
Morphological Instability in InAs/GaSb Heterostructures
Surface Characterization of Single Crystal ZnO and Nanocrystlline ZnO Thin Films Using Atomic Force Microscopy and Lateral Force Microscopy.
Effects of Ta Crystallites at the TaAl/Al-Cu Interface of Hyper-Texture Aluminum
Micromechanical Properties of Silicate-Glass Films on Sapphire Substrates
Residual Stress Effects on Adhesion and Fracture of Thin Electronic Ceramic Films.
Microstructural Effects on the Strength of Diamond Thin Films
TF2-WeA
Application of In-Situ Mass Spectroscopy of Recoil Ions for MBE Growth of GaN Thin Films
In Situ Real-Time Studies of AlN and GaN Growth by Low-Energy Electron Microscopy (LEEM)
Determination of Slowly Varying Refractive Index Profiles from In Situ Spectrophotometric Measurements
In Situ Sputter Deposition Plasma Charaterization for Tailoring Ceramic Film Growth
Characterization by Real Time Spectroscopic Ellipsometry of Carbon and SiC Thin Films Grown by Pulsed Laser Deposition
Metalorganic Chemical Vapor Deposition of Tin Oxide in the Environmental Scanning Electron Microscope Chamber
Quantitative Analysis of Real Time In Situ Infrared Spectra for the Study of Surface Reactions: Theory and Experiments.
Temperature Induced Phase Transitions in Polystyrene Films and Colloid Particles Studied with a Quartz Crystal Microbalance
VT-WeA
A Miniature Quadrupole RGA For Process Monitoring At Millitorr Pressures
Response Time and Sensitivity Optimization of Faraday Cup Equipped Miniature Quadrupole Mass Spectrometers
High Resolution Quadrupole Mass Spectrometry Through Operation Using Alternate Mathieu Stability Regions
Advances In Partial Pressure Measurements for Semiconductor Processes
Stable Cancellation of X-Ray Errors in Bayard-Alpert Gauges
A New Standard for Low-Pressure Gauges
Orifice Flow Calibration of Ion Gages for Industrial Use
Pushing the Spinning Rotor Gauge Sensitivity by a Compression Stage
Application of Calculated Physical Adsorption Isotherms to a Radon Sensor
Sessions | Time Periods | Topics | Schedule Overview