AVS1997 Monday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
Session | Monday, October 20, 1997 | ||||||||||
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8:20 AM | 9:20 AM | 10:20 AM | 11:20 AM | ||||||||
AS-MoM |
Variable Temperature AFM on Electrically Insulating Surfaces
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Si-Based Heterolayer and Device Structures Observed by Cross-Sectional STM
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Effects of Crosslinking on the Spreading of 150 nm Polymer Particles
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High Pressure Adsorbate Structures Studied by Scanning Tunneling Microscopy: CO on the Pt(111) Surface
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Evaluation of Phase Separation in PVC/PMMA Blends using Photoelectron and Ion Imaging
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Laboratory Size Micro-XPS System with a Laser-Plasma X-ray Source
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The Application of a Spherical Mirror Analyser to High Resolution Imaging XPS
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Understanding Bonding in Glass Fiber Materials Through a Comparison of Large and Small Area X-ray Photoelectron Images and Spectra
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X-ray Spectro-microscopy; A New Technique for Materials Science
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EM-MoM |
New Trends in Lightwave Communications
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Novel Optoelectronic Devices using Wafer Bonding
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III-V Technology, Materials and Processing for Photonic Integration
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Fibers for the 21st Century: Materials Challenges
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Optical Communication Technology Challenges for Polymeric Integrated Optic Waveguide Circuitry
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Optical Demultiplexer Devices for Communication Systems using Wavelength Division Multiplexing
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EM+ |
Atomic Scale Processes During Oxidation at Si(001)-SiO2 Interfaces
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Experimental and Theoretical Studies of the Initial Water-Induced Oxidation of Si(100)-2x1
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Real-Time Core-Level Spectroscopy of Initial Thermal Oxide on Si(100)
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High Resolution XPS Study of Ultrathin Oxynitride Films on Si(100).
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Direct Observation of Si Lattice Strain and its Distribution in the Si(001)-SiO2 Interface Transition Layer with Medium Energy Ion Scattering Spectroscopy
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Optimization of Si-SiO2 Interface Chemistry and Structure by Combined Plasma and Rapid Thermal Processing.
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Processing Dependence of the Structure and Electrical Characteristics of the Si/SiO2 Transition Layer.
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Si/SiO2 Interface Roughness: Comparison between Surface Second Harmonic Generation and X-ray Scattering
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Measurements of Nitrided SiO2/Si Interface Roughness By Crystal Truncation Rod Profiling
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Recent Improvements in Measuring Ultrathin Oxynitride Layers Using Secondary Ion Mass Spectrometry (SIMS)
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MI-MoM |
Oscillatory Exchange Coupling in Magnetic Multilayers.
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Fe/Rh Multilayers: Magnetic and Structural Characterization
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Magnetic Anisotropy and Atomic Structure of the Fe/GaAs Interface*
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Structural and Magnetic Phases of Ultrathin Fe Wedges on Diamond (100)*
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Exploring Step-Induced Magnetic Anisotropies in Ultrathin Films
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Co on Stepped Cu(100) Surfaces: A Comparison of Experimental Data with Monte Carlo Growth and Micromagnetics Simulations.
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Direct Observation of Interface Roughness Dependence of Interfacial Magnetism using Diffuse X-ray Resonant Magnetic Scattering
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Correlating Changes in Magnetic Roughness with Variations in the Helicity Dependent Soft X-ray Resonant Diffuse Scattering
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MS-MoM |
Ultra Clean Society's Activities for Manufacturing Science and Technology
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Real-Time Monitoring of Scattered Laser Light by a Single Particle of the Order of Several Tens Nanometers in the Etching Chamber in Correspondence with its Equipment Status
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Pit-Free Electropolishing of Aluminum and its Application for Process Chamber
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TEOS/O3 CVD to Employ a Clean and High Density Ozone Generator
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Integrated Compact Gas Delivery System
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Etching/Deposition Uniformity in Flat Parallel Electrode Plasma Systems Using Shower Head
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Self-Consistent Particle Simulation of Radio-Frequency CF4 Discharge with Implementation of All Ion-Neutral Reactive Collisions
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Suppression of Impurity-Backdiffusion in Vacuum Pumping Systems for Ultraclean Low-Pressure Semiconductor Processing
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High Density Microwave Plasma Source without Magnetic Field for Large Area PECVD and Plasma Oxidation
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Highly-Reliable Ultra Thin Gate Oxide Formation by Employing a New Water Vapor Generator
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NS+ |
Molecular Aspects of Friction: Systematic Studies of the Frictional Properties of Selectively Fluorinated Self-Assembled Monolayers
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Mechanical Properties of Alkylsilane Monolayers with Mixed-Chain-Length
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Applications of Multi-task Scanning Probes to Friction and Adhesion
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Nanofriction and Nanoimaging at the Insulator-Liquid Interface
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Atomic-Scale and Nano-Scale Frictional Behavior of Clean and Hydrogen-Terminated Diamond(111) Surfaces
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Quantized Friction and Atomic Lattice Resolution in AFM Imaging
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Nanotribology of Single Crystal Metals
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Friction at Sub-Micron Lengthscales
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Growth and Tribological Properties of Thin Ice Films.
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Scanning Force Microscope Observations of Corrosive Wear in Single Crystal Carbonates and Phosphates
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PS-MoM |
Plasma Charging in ULSI Fabrication
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The Physics of Plasma-Induced Charging Damage
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Plasma Measurements and Plasma Damage in a High-Density, Inductively Coupled Metal Etcher
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Radiation Damage Effects in a High Density Plasma
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Pattern Dependent Wafer Charging in an Inductively Coupled Metal Etch System
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Reduction of Electron Shading Effect on Gate Etching using High Pressure HBr Gas Chemistry
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Mechanisms Involved in Plasma Charging Induced Device Damage
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Non-Contact Electrical Characterization of Plasma Damage
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Observation of Channel Shortening in n-MOSFETs Arising from Interconnect Plasma Processing
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PS+ |
Wafer Level Ion Energy Analyzer for Plasma Analysis
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A Compact Floating Energy Analyzer for Measuring Energy Distributions of Ions Bombarding a rf Biased Electrode
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Preliminary Empirical Results Suggesting the Mapping of Dynamic in situ Process Signals to Real Time Wafer Attributes in a Plasma Etch Process
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Spectral Interferometry -- A Novel Process Control Diagnostic.
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Plasma Sensors for Diagnostics and Control in Semiconductor Process Development and Manufacturing
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A Deposition-Tolerant Ion Flux Probe for In-Situ Process Control
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High-Density Plasma Diagnostics: Using Optical Emission Spectroscopy to Determine Electron Temperature, Plasma Density and Cl2 Percent Dissociation
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RF Electrical Measurements as Sensors for Physical Properties of Plasmas
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Real-Time Control and Modeling of Plasma Etching.
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QS-MoM |
Surface Composition and Topography of Compound Semiconductors after Sputtering.
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Ion-Implanted Reference Materials for the Semiconductor Industry
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Quantitative Analysis by Static SIMS: Exploiting All the Information in the Spectra
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Surface Analysis Using Slow, Highly Charged Ions like Au69+
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Contribution of SIMS Analysis to Characterization of GaN and Related Compounds
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SS+ |
Orientation and Order in Microcontact-Printed, Self-Assembled Monolayers of Alkane Thiols on Gold, Investigated with NEXAFS
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Ordered Thiophene, Methanethiol, and Benzeneselenol Monolayers on Au(111) formed by Gas- and Liquid-phase Deposition: New Insights into the Chemisorption Mechanism.
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Nucleation and Growth Phenomena in Organic Amphiphile Monolayers
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Forced Alignment of Adsorbed Organic Monolayers During STM Observation.
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Molecular Monolayer Dynamics: Atomistic Potentials and Ensemble Responses
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Simulation of Interfaces using Molecular Dynamics
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Effect of the Environment on the Molecular Orientation of Thiol Monolayers Investigated by Second Harmonic Generation (SHG)
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Self-Assembled Monolayers of n-alkane Thiols: Investigation of Chain Length Dependence by Nonlinear Optical Vibrational Spectroscopy
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Thermal Behavior of Alkylsiloxane Self-Assembled Monolayers on the Oxidized Si(100) Surface
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The Influence of Surface Modifiers on the Kinetics of Methanol Electrooxidation at Platinum Surfaces
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SS1-MoM |
Clean and Modified Oxide Surfaces: Structure and Reactivity
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Metal Adsorption Calorimetry and Adhesion Energies on Clean Single-Crystal Oxide Surfaces
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Oxygen Adsorption and Oxide Formation on Ni3Al(111)
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The Growth and Characterization of Ag and Au Clusters on Al2O3/Re(0001)
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Laser Desorption Mass Spectrometry and Vibrational Spectroscopy of Hydrocarbon Chemistry on Hydroxylated and Non-Hydroxylated Al2O3 Surfaces
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Thermal and Electron-Stimulated Desorption of Na from Amorphous SiO2 Films Grown on a Re(0001) Surface.
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CO Oxidation on Gold-Covered Pt(335), A Potential Sensor Electrode
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The Interaction of Sulfur with Metal/Oxide Surfaces
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Structure and Stability of ZrO2 Surfaces and the Ni/ZrO2 Interface
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SS2-MoM |
Diffusion of Hydrogen on Si(001) by Hot STM and Atomistic Modelling
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Adsorbate Influence on the Diffusion of Individual Pt Atoms on Pt(110)
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Diffusion of Hydrogen and Deuterium on Ni(111) over a Wide Temperature Range: Exploring Quantum Diffusion on Metal Surfaces
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Hydrogen Inhibition of Exchange Diffusion on Pt(100)1
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Diffusion of Pt Adatoms and Dimers on Pt(111)
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In-Situ STM Experiments and Predictive Modeling of Grain Growth Kinetics in Two Dimensions.
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Separating Out the Prefactor and the Step Edge Barrier of Interlayer Diffusion for Ag/Ag(111) Homoepitaxy
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Surface Segregation of Low-Energy Ion-Induced Defects in Silicon
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Quantum Coherence in Tip-Surface Transfer of Adatoms in AFM/STM
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Elementary Steps of Lateral Translation of Cu, Pb, Pb2 and CO Studied by Low Temperature STM
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TF+ |
Polycrystalline Silicon Thin Films for Active-Matrix Flat-Panel Displays
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Characteristics of Amorphous and Polycrystalline Silicon Films Deposited at 120 °C by ECR-PECVD
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Plasma Conditions for the as-grown Low Temperature Poly-Si Formation on the SiO2 Substrate by a Sputtering and PECVD Processes
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Vacuum Deposition Processes for Large Area, Roll-to-Roll Flexible Substrates
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Plasma Enhanced Chemical Vapor Deposited Silicon Nitride Thin Films Deposited at Very Low Temperatures for Thin Film Transistors on Plastic Substrates.
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Low Temperature Plasma Deposition of Silicon Nitride from Silane and Nitrogen Plasmas
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Real Time Substrate Misalignment Monitoring and Recalibration
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The National Technology Roadmap for Flat Panel Displays
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VM+ |
Post Deposition Reduction of Noble Metal Doped ZnO Films
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Development and Scale-Up of a Multifunctional Antireflection Coating, Sputter Deposited on Plastic Film
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Product Manufacturability, Process Scale-up and Technology Transfer
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The Transition to 300mm Silicon Wafer Process Equipment
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Scale-Up for Semi-Conductors of Dual Magnetron Sputtering using Pulsed Power
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Scaling Up of Sputtering Processes to Industrial Dimensions
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Real-Time In-Situ Ellipsometric Studies for Rapid Scale-up of TiN Thin Film Growth by Magnetically-Enhanced Reactive Unbalanced Magnetron Sputtering
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