ALD/ALE 2025 Session NS-MoP: Nanostructure Synthesis and Fabrication Poster Session

Monday, June 23, 2025 5:45 PM in Room Event Hall
Monday Evening

Session Abstract Book
(334 KB, Apr 8, 2025)
Time Period MoP Sessions | Topic NS Sessions | Time Periods | Topics | ALD/ALE 2025 Schedule

NS-MoP-1 Structural Modifications of Porous Templates with Pbte ALD Coatings
Haifeng Cong, Helmut Baumgart (Old Dominion University)

Porous silicon templates have attracted increasing attention because of their controllable geometry, tunable nanoporous structure, large pore volume/high specific surface area, and versatile surface chemistry. Porous templates show significant advantages and application potential in microfluidics, electro-osmotic pumps, biomedical drug delivery, sensing, photonics, integrated opto-electronics, energy conversion, thermoelectrics, thermo-acoustics, electronics and Lab-on-a-chip technology for biomedical, pharmaceutical and environmental monitoring. For this study we have focused on energy conversion with ALD lead chalcogenide PbTe film coatings since PbTe is a useful narrow band gap thermoelectric material that can operate at comparatively higher temperatures in the range of 600~850 K due to its better chemical stability and high melting point. PbTe thin films have been synthesized inside of porous silicon templates with native oxide by Atomic Layer Deposition (ALD) using lead (II)bis(2,2,6,6-tetramethyl-3,5-heptanedionato) (Pb(C11H19O2)2), (trimethylsilyl) telluride ((Me3Si)2Te) as ALD precursors for lead, and tellurium. The Si native oxide surface was functionalized before ALD PbTe thin film deposition to ensure reproducible chemisorption of the ALD precursor compounds. The growth temperature during ALD was varied over a range from 135oC to 170oC. The Lead precursor was volatilized at a temperature of 140 oC and the Tellurium precursor was heated at 40 oC. The chamber base pressure was kept at 40 mTorr.Several physical characterization techniques have been employed to determine the ALD PbTe thin film characteristics. The crystal structure and phase purity of samples of PbTe films were analyzed by X-ray diffraction (XRD). The film morphology and structure of the products were determined by field emission scanning electron microscopy (FE-SEM) and high-resolution transmission electron microscopy (HR-TEM). The surface roughness was analyzed by atomic force microscopy (AFM). The analysis of the composition and stoichiometry of the ALD coatings were carried out by Energy dispersive X-ray spectroscopy (EDS). The experimental evidence revealed the ALD growth of lead telluride followed the Vollmer-Weber Island growth model. We found a strong dependence of the nucleation process of the polycrystalline grain distribution on the temperature.We report a systematic study of all ALD parameters required to optimize the coating of the interior walls of porous membranes which open front and backside, straight pores of varying diameter and porosity with dead endings in the substrate and pores with spatially modulated ondulating cross sectional shapes.

NS-MoP-2 Area-Selective Solid-State Synthesis of Nickel Silicide Nanostructures
Gabriele Botta, Mato Knez (nanogune)

Over the past decade, metal silicides have been re-discovered for their significant potential across various fields of nanotechnology. [1,2,3] However, integrating them into modern devices continues to pose challenges, primarily due to limited control over phase formation during their synthesis. [4] Additionally, since they are typically grown as continuous layers, their structuring often relies on complex top-down patterning techniques, which significantly limit their practical applications. [5] This study addresses these issues by proposing a method for Area-Selective (AS) silicidation (Fig. 1a SD). Our approach ensures that during material synthesis, the resulting silicide nanostructures acquire a predefined morphology and nucleate exclusively in the targeted regions of the substrate.

The AS silicidation process is demonstrated through the formation of NiSi₂ structures on Si(100) and Si(111) substrates (Fig. 1b SD), and its broader applicability is further illustrated with the successful AS synthesis of Cu₃Si (Fig. 1c SD). To direct growth, the silicon substrates are patterned using ion beams, which create surface defects that promote silicide nucleation in the desired areas. Unlike conventional Solid State (SS) synthesis, which involves annealing a metal thin film on silicon, our method begins with an ALD deposited metal oxide. Silicidation is performed by annealing in the presence of a reductant (H₂), which reduces the metal oxide to its metallic state. The resulting metal then reacts with the underlying silicon, forming a metal silicide. During this two-step reaction, the material re-arranges along surface defects, which act as templates, guiding both the shape and positioning of the forming silicide crystals.

The effectiveness of this multi-step fabrication method, coupled with its adaptability to various metal-silicide systems, underscores its potential to create functional, structured silicides without the need for post-synthesis nanopatterning.

References

  1. Z. He, Y. He, Y. Qiu, Q. Zhao, Z. Wang, X. Kang, L. Yu, L. Wu, Y. Jiang, Appl. Catal. B Environ. 2024, 342, 123386.
  2. Y. Niu, K. Zhang, X. Cui, X. Wu, J. Yang, Nano Lett. 2023, 23, 2332–2338.
  3. R. Reichlova, H. Lopes Seeger, R. González-Hernández, Nat. Commun. 2024, 15, 4961.
  4. Y. C. Chou, L. J. Chen, K. N. Tu, Nano Lett. 2022, 22, 6895–6899.
  5. N. Breil, C. Lavoie, A. Ozcan, F. Baumann, N. Klymko, K. Nummy, B. Sun, J. Jordan-Sweet, J. Yu, F. Zhu, S. Narasimha, M. Chudzik, Microelectron. Eng. 2015, 137, 79–87.
NS-MoP-3 Atomic Layer Deposition by Pressure-Driven Convective Flow Through 3D Nanocomposite Structures
Austin Cendejas, Benjamin Greenberg, Kevin Anderson, Boris Feygelson (US Naval Research Laboratory)

Conformal coating of high aspect ratio tortuous 3-dimensional nanostructures has been shown to require careful consideration of dose and purge times to achieve uniform ALD coatings of high quality.1,2 Specifically, through static-dosing of ALD precursors cycle times for complete surface saturation are often in excess of 10s of minutes for macroscopic substrates.2 Recently our group has demonstrated an order of magnitude reduction in saturation dose times by forcing precursor flow through the compact via a pressure gradient of 50-100 Torr across the 3D nanocomposite. In this work, diethylzinc (DEZ) and water were pulsed sequentially to deposit conformal films of ZnO completely through the ~2mm thickness of nanocomposite compacts comprised of 200 nm SiO2 nanoparticles. Due to the nonuniform pressure across the nanocomposite compact, precursors undergo a transition from convective to diffusive transport. Preliminary modeling of the internal pressure gradients of the compacts was utilized to determine the relative contributions of these two transport modes in addition to structural nonuniformities (i.e. cracks, large pores, etc.). It was found that uniformity in the internal pore structure and structural integrity of the initial, uncoated, nanoparticle compact was crucial in achieving uniform coatings on the entire surface. Additionally, the effect of precursor partial pressure during doses on saturation dose times and the extent to which the diffusive transport could be enhanced was studied. Saturation dose times were measured via in-situ quadrupole mass spectrometry of the effluent gas and film uniformity and conformality were studied via ex-situ­ cross-sectional scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDXS), and X-ray diffraction (XRD).

1. Gayle, A. J.; Berquist, Z. J.; Chen, Y.; Hill, A. J.; Hoffman, J. Y.; Bielinski, A. R.; Lenert, A.; Dasgupta, N. P. Tunable Atomic Layer Deposition into Ultra-High-Aspect-Ratio (>60000:1) Aerogel Monoliths Enabled by Transport Modeling. Chem. Mater. 2021, 33 (14), 5572–5583.

2. Greenberg, B. L.; Anderson, K. P.; Jacobs, A. G.; Cendejas, A. J.; Hajzus, J. R.; Patterson, E. A.; Wollmershauser, J. A.; Feigelson, B. N. Conformal Coating of Macroscopic Nanoparticle Compacts with ZnO via Atomic Layer Deposition. J. Vac. Sci. & Technol. A 2023, 42 (1), 012402.

NS-MoP-6 Creation of Nanowire-Bundled Grain Boundaries in Bi2Te3-Based Thermoelectric Materials via Atomic Layer Deposition
Gwang Min Park, Seunghyeok Lee (Korea Institute of Science and Technology (KIST)); Jinseok Hong, Seokho Nahm (Hanyang University, Korea); Seung-Hyub Baek, Jin-Sang Kim (Korea Institute of Science and Technology (KIST)); Seung-Yong Lee (Hanyang University, Korea); Seong Keun Kim (Korea Institute of Science and Technology (KIST))

Improving thermoelectric material performance is essential for energy harvesting and solid-state cooling applications. This study demonstrated a novel structure of Bi₂Te₃-based thermoelectric materials with ZnO nanowire-bundled grain boundaries, realized via atomic layer deposition (ALD) and subsequent spark plasma sintering (SPS). The ZnO nanowires formed at the interfaces due to the rearrangement of the ALD-grown ZnO ultrathin layer over Bi0.4Sb1.6Te3 powder, driven by localized heating during the SPS process and the anisotropic nature of ZnO. The nanowire-bundled interfaces enhanced phonon scattering, thereby reducing lattice thermal conductivity while maintaining excellent electronic transport. This structural innovation achieved a high figure-of-merit, zTmax = 1.69 ± 0.09 at 373 K and an average zT of 1.55 over the range of 300–473 K. A thermoelectric module fabricated with 127 p–n pairs achieved a record-high conversion efficiency of 6.57% at a temperature difference of 163 K. These findings highlight the potential of nanowire-bundled interfaces to enhance the thermoelectric material performance and pave the way for scalable next-generation energy conversion technologies.

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NS-MoP-7 Surface Engineered Polymeric Membranes for Improved Fouling Resistance and Superior Oil-Water Separation
Bratin Sengupta, Yining Liu, Seth Darling, Jeffrey Elam (Argonne National Laboratory)
Fouling is a grand challenge which severely degrades membrane system performance, especially for applications in water treatment. Polyvinylidene fluoride (PVDF) is widely used for membrane fabrication due to its inertness and stability. However, PVDF is extremely susceptible to fouling due to its inherent hydrophobicity. Post-synthetic functionalization of PVDF membranes can increase the membrane-foulant interaction energy and reduce fouling. In this regard, vapor phase functionalization is particularly promising since it can produce ultrathin films (<5 nm) which do not alter the membrane pore structure and morphology. For example, thin metal oxide layers impart hydrophilicity and are often positively charged at the pH of the wastewater, realizing high membrane – foulant interaction energy. Atomic layer deposition (ALD) can produce ultrathin metal oxide layers on polymers, but the inert PVDF surface inhibits nucleation necessitating a prohibitively large number of ALD cycles to impart fouling resistance. In this presentation, I describe a novel pretreatment step that dramatically accelerates the nucleation of metal oxide ALD on PVDF. Using this pretreatment, we create highly effective anti-fouling surfaces using one ALD cycle compared to >150 ALD cycles on the pristine PVDF membranes. This strategy is effective for a range of ALD metal oxides including Al2O3, TiO2, and ZnO. We employ a suite of in situ and ex situ analytical techniques to elucidate the surface chemical mechanism for the enhanced nucleation. We perform extensive characterization and testing of the surface-engineered PVDF to quantify the benefits for water filtration and demonstrate >99% flux recovery with only ~1% irreversible flux loss during operation. We also demonstrate the efficacy of our surface engineered PVDF membranes for oil-water separation. Efforts are underway to perform this surface treatment using our roll-to-roll, atmospheric pressure spatial ALD system.
NS-MoP-8 Interface Engineering of 2D MoS2 Devices through ALD Oxidant Selection
Si Eun Yu, Thi Thu Huong Chu, Minjong Lee, Dushyant M. Narayan, Doo San Kim, Dan N. Le (University of Texas at Dallas); Rino Choi (Inha University); Jiyoung Kim (University of Texas at Dallas)

Two-dimensional transition metal dichalcogenides (2D TMDCs) have emerged as promising semiconductor materials for next-generation electronic devices due to their high mobility within atomic-scale thickness. To preserve the superior performance of 2D semiconductors in field-effect-transistor (FET) applications, gate dielectrics should be deposited via physisorption to prevent chemical reactions between the atomic-scaled 2D surface and ALD precursors.[1] A straightforward approach to achieving this is reducing the deposition temperature; however, this is often accompanied by the formation of lower-quality gate dielectrics. It is thus essential to establish alternative strategies for gate dielectric deposition, such as exploring precursors and/or employing advanced ALD techniques.

This study will present a promising approach utilizing H2O2 as an oxidant source for gate dielectric deposition, along with a strategy to achieve uniform deposition without damaging 2D materials. Comparative studies were conducted using H2O, O3, and H2O2 for high-k HfO2 growth on 2D MoS2. Each oxidant exhibited distinct growth behaviors. While O3 facilitated uniform HfO2 deposition, its strong oxidation effect led to Mo-S bond conversion into Mo-O bonds, inducing damage to the MoS2 surface. The resulting surface damage led to degraded FET device performance, indicating that O3 cannot be a viable candidate for high-k dielectric deposition on 2D semiconductors. For H2O and H2O2, achieving fully conformal coverage remains a significant challenge. To address this limitation, stop-valve techniques were employed to extend oxidant exposure time and dosage, effectively enhancing dielectric coverage while maintaining interface integrity. The interface properties were further analyzed using a top-gate FET structure,[2] providing insights into the interface trap density associated with different oxidants.

This presentation will cover material characterization, ALD techniques, and electrical performance, offering a comprehensive evaluation of oxidant effects on 2D semiconductor integration.

This work was supported by Samsung Electronics through GRO program (IO240612-10229-01). We gratefully acknowledge TMEIC for ozone generator (OP-250H) and RASIRC for BRUTE® Peroxide. S. E. Yu acknowledges KIAT/MOTIE (RS-2024-00435406).

[1] S. Yang et al., Adv. Mater. 35, 2207901 (2023). [2] Y. C. Lin et al., IEEE Trans. Electron Devices 70, 1598-1613 (2023).

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NS-MoP-9 Facile Synthesis of Copper Germanium Oxide with Carbon Shell for Lithium Ion Battery Anode Applications
Deug Hyun Nam, Chan Woong Na, Yoon Myung (Korea Institute of Industrial Technology)

Metal germanates such as Zn₂GeO₄, Fe₂GeO₄, and Co₂GeO₄ have been widely studied for various applications, including catalysts, sensors, lasers, and batteries. Cu₂GeO₄ has recently emerged as a promising candidate for lithium-ion battery anodes and sensor technologies, owing to its high mechanical strength, structural stability, and potential for enhanced electrochemical performance. However, traditional synthesis methods for Cu₂GeO₄ despite its promising properties, the synthesis of Cu₂GeO₄ remains challenging, with traditional methods often requiring high temperatures or complex multi-step processes. In this study, we introduce a simple and effective hydrothermal method for synthesizing carbon coated Cu₂GeO₄ nanoparticles. The size distribution of CuGe2O4 nanoparticles were in the range of 20 to 50 nm, as observed through scanning electron microscopy (SEM), and their structure was confirmed as tetragonal by X-ray diffraction (XRD) (JCPDS 83-1872). Raman spectroscopy indicated the presence of crystalline Ge, supporting the material’s structural integrity. These Carbon coated Cu₂GeO₄ nanoparticles show significant potential for lithium-ion battery anodes where their enhanced chemical and mechanical stability, and electrochemical performance offer significant advantages over conventional materials.

NS-MoP-10 Amorphous Boron Nitride Deposited on MoS2 Monolayers by Thermal Atomic Layer Deposition for High-Performance Two-Dimensional Electronics
Yu-Chuan Lin (National Yang Ming Chiao Tung University (NYCU))

We report a wafer-scale, low-temperature process using thermal atomic layer deposition (ALD) with sequential flows of BCl3 and NH3 for the synthesis of uniform, conformal amorphous boron nitride (aBN) thin films on Si and 2D semiconductors. The deposition temperatures of aBN between 125 and 250 °C lead to stoichiometric BN films with high stability against oxidation and yield a dielectric strength of 8 MV/cm. The impact of ALD processing parameters on the resulting morphology, atomic compositions, and structural properties of aBN on Si was evaluated. Furthermore, we present the ALD of ultrathin (2–20 nm) aBN as a scalable and non-water-based process for dielectric integration with 2D semiconductors. The lack of nucleation sites on van der Waals surfaces to form thin, uniform dielectric layers could lead to interfacial defects that degrade the device performance. Therefore, by utilizing two-step approach including in situ seeding at lower temperature and carrying out ALD back at regular temperatures, we were able to form uniform aBN dielectric layers on 2D surfaces and fabricate few-layer quantum well structures made of aBN/MoS2 building blocks and aBN-encapsulated double-gated monolayer MoS2 field-effect transistors to investigate the impact of aBN dielectric on MoS2 properties. Our work in scalable aBN dielectric integration provides a means for improving the performance of 2D materials for next-generation electronics.

Session Abstract Book
(334 KB, Apr 8, 2025)
Time Period MoP Sessions | Topic NS Sessions | Time Periods | Topics | ALD/ALE 2025 Schedule