ALD/ALE 2024 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Tuesday, August 6, 2024 | |||||||||||||||
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| 8:00 AM | 9:00 AM | 10:00 AM | 11:00 AM | |||||||||||||
| AA1-TuM |
Leakage Control of DRAM High-k Capacitor Stack by Ald Sc2O3, Y2O3 Inter-Layer
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ALD Deposited IGO with High Thermal Stability (~ 800 oC) by Controlling Crystallinity for Multi-bit Operation 2T0C DRAM
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Improving Electrical Properties of ZrO2 Dielectric Films Without Sacrificing Tetragonal Crystallinity via Gd Doping
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Area Selective Co ALD for Highly Reliable ULSI Interconnect System and the Establishment of ALD Process Design Framework
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Atomic Layer Deposition (ALD) of Transition Metal Dichalcogenides (TMDS) Layers as Metal Diffusion Barriers for Back-End-of-Line (BEOL) Applications
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High-Quality Co Thin Film by Thermal ALD Using CCTBA Precursor by Controlling H2 Dose
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Improved Properties of Atomic Layer Deposited Ru Films by Providing Additional Reactant for Cu Alternative Interconnects
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Break & Exhibits
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| AA2-TuM |
ALD Layers and Interfaces in Next Generation Photovoltaics
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Utilizing Low-Temperature Ald Technique to Investigate Perovskite Nickelates for Photovoltaic Applications
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Atomic Layer Deposition of Defect-Engineered TiOx and TaOx Protective Coatings for Photoelectrochemistry
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Influence of Atomic Layer Deposition Tin Oxide Properties on the Performance of Perovskite Solar Cells
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| AF1-TuM |
Navigating the Semiconductor Market for ALD Precursors - in the Past and in the Future
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Improvement of COSMO-SAC Method for Estimating Vapor Pressure of ALD Precursors
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ALD Young Investigator Award Finalist Talk: Development of Precursors and Reactivity for Thermal Atomic Layer Deposition (ALD) of Main Group Elements
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A New ALD Process for Elemental Tellurium
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Development of an Innovative Method to Find New Efficient Gallium ALD Precursors
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Atomic Layer Deposition of Co2P Thin Films
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The Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Depositionof Oxides on Metal Surfaces
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Break & Exhibits
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| AF2-TuM |
Plasma-Enhanced ALD of Ga2O3 and Gan with Remote CCP-Plasma, Short Cycle Times, and Substrate Biasing
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YxC Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition as a Diffusion Barrier and Glue Layer for Cu & Ru Interconnects
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Plasma Enhanced Atomic Layer Deposition of Boron Nitride
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Time-Resolved Study of OH Radicals During PEALD of Al2O3 by Advanced Laser Spectroscopy
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Engineering of Vox Properties Through Control of Plasma Characteristics During Plasma-Enhanced Atomic Layer Deposition
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| ALE1-TuM |
Current Status of ALE in Semiconductor Processes
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ALE Preparation of Diamond Surfaces for Materials and Device Applications
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Comparison of Different PEALE Modes on AlGaN/GaN Heterostructures
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Quasi-ALE Process for GaN: High Etching Rate Without Compromising the Surface Roughness
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A New Challenge for Developing Novel Atomic Layer Etching: Applying the Leidenfrost Effect to Obtain Floating Nanomist-Assisted Vapor Etching
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Electron-Enhanced Etching of Molybdenum Using Sequential O2 and HCl Reactive Background Gases to Form Volatile Molybdenum Oxychlorides
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Impact of Activation Strategies for Sio2 Atomic Layer Etching Applied to Contact Patterning
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Break & Exhibits
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| ALE2-TuM |
Thermal Etching of Metals and Metallic Materials for Gate-All-Around Devices
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Low Temperature, Conversion-Free Thermal Atomic Layer Etching of Zinc Oxide using Hydrofluoric Acid and Trimethylgallium
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Thermal Atomic Layer Etching of the Indium Gallium Zinc Oxide (IGZO) Family by Fluorination and Ligand-Substitution Hydrogen-Transfer Reactions
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Designing an ALE Process and Uncovering the Etching Mechanism for a 2D van Der Waals Material: Ternary Transition Metal Chalcogenide CrPS4
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| AM-TuM |
Development of a Modular Manufacturing Equipment Architecture for Application Tailored Process Options
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Optimizing Precursor Utilization for Spatial ALD in High Surface Area Substrates
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Development and Scale-up of ALD onto Synthetic Graphite Powder in a Continuous Vibrating Reactor for Battery Applications
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Ultra High Speed Spatial PEALD Using a Novel Precursor Separation Method
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An Innovative 3D Solution for High Throughput Roll-to-Roll ALD
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A Novel Technique for Pulsed Liquid Source Vapor Delivery in ALD and Short-Pulse CVD
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In-situ Spectroscopic Ellipsometry During Spatial ALD of Al2O3, ZnO, and SnO2
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Break & Exhibits
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| AS-TuM |
A Novel SMI for AS-ALD
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Atomic Layer Plasma Treatment for Area-Selective Atomic Layer Deposition of High-Quality SiO2 Thin Film
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Enhancing Selectivity for AS-ALD of MoO2 through Hydrogen Treatment: Strategy of Surface Cleaning and Expanding Deactivated Areas
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Contra-Selective Deposition of SiO2 on Metals
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Photoluminescent Graphene-Lanthanide Heterostructures via Direct Laser Writing and Area-Selective Atomic-Molecular Layer Deposition
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