ALD/ALE 2022 Wednesday Afternoon

Effects of Ultra-thin Atomic Layer Deposited MgO Buffer Layer on Structural and Electrical Properties of Beo and HfO₂ Films for Dynamic Random Access Memory Capacitors

Atomic Layer Deposition of Ternary Germanium-Sulfur-Selenium and Its Application for Ovonic Threshold Switching

Scaling Down to sub-5 nm Ferroelectric Hf_0.5Zr_0.5O₂ Thin Films with Anhydrous H₂O₂ ALD Oxidant

Engineering the Ferroelectric Properties in Hafnium Oxide by Co-Doping during Atomic Layer Deposition

Magnetic and Electric Properties of Atomic Layer Deposited HfO₂-Fe₂O₃ Thin Films

Atomic Layer Deposition of Antiferroelectric Perovskite Lead Hafnate Using O₂-Gas-Only as the Oxygen Precursor

In-situ Half-Cycle Study of High Purity H₂O₂-based HfO₂ Atomic Layer Deposition for Hf based Ferroelectric Devices Applications

Superconducting Tantalum Nitride Prepared by Plasma ALD With RF Biasing for Quantum Applications

Membrane Design by ALD for Hydrogen Purification

Mechanical Properties of ALD Coatings

Polystyrene Brush Deactivation Layers for Area Selective Atomic Layer Deposition

Area Selective Deposition of Ruthenium using a W Precursor Inhibitor

Electron-beam Functional Group Pattering on HOPG for Area-Selective Atomic Layer Deposition

Inhibitor Adsorption During Area-Selective ALD: Do Mixtures of Adsorption Configurations Lead to a Loss of Selectivity?

Area Selective Deposition for ZnO Hard Mask by 2D-like Carbon fabricated by Molecular Layer Deposition

Bifunctionality of Si Precursors to Enable Area Selective Deposition of Ru and Atomic Layer Deposition of SiO₂

TiO₂ Area-Selective Deposition: Using Selectivity Loss Mechanisms to Advance Applications in Nanopatterns and EUV Resist Materials

Intrinsic Area-Selective Atomic Layer Deposition of Aluminium Nitride

Surface-Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition

Study on Area-Selective Atomic Layer Deposition of Al₂O₃ with a Series of Al Precursors

Selective Hydration of TiO₂ and In₂O₃: A Strategy for Site-Selective Atomic Layer Deposition at Surface Defects

Self-Assembled Monolayer and “Click” Chemistry Deposition Treatments for Area-Specific Processing

ALD of In_1-XGa_XN

Silicon-Based Polymer-Derived Ceramic Coatings by Post-Processing of Pre-Ceramic MLD Thin Films

Closing in on Room-Temperature Metal-Insulator-Transitions for Next Generation Electronics by Epitaxial Nickelate ALD

Plasma-Enhanced Atomic Layer Deposition of Spinel Ferrite CoFe₂O₄ and NiFe₂O₄ Thin Films

Engineering Maxwell-Wagner Polarization in Al₂O₃/TiO₂/Al₂O₃ Nanolaminates Grown by Atomic Layer Deposition

Vapor Phase Infiltration of Polymers for the Synthesis of Organic-Inorganic Hybrid Materials: Process Kinetics, Chemical Pathways, and Final Hybrid Structure

Atomic Layer Deposition on Polymer Thin Films: On the Role of Precursor Infiltration and Reactivity

Obtaining Robust Hydrophilic Surface on Soft Polymer Through Atmospheric Pressure ALD

Modified 3D Printed Architectures: Effects of Infiltration by Alumina on ABS

Polymer-Inorganic Hybrids for Inducing Self-Healing Functionality in Metal Oxides

Tailoring the Interfacial Interactions of Porous Polymer Membranes to Accelerate Atomic Layer Deposition: The Latent Path to Antifouling Membranes

Ruthenium Nanostructures via Sequential Infiltration Synthesis in Self-Assembled Diblock Copolymer Thin Films

Photoactive Hybrid Materials by MLD

Cerium (III) based Hybrid Inorganic-Organic Thin Films by ALD/MLD

Modifying the Physico-Chemical Properties of Polymer Nanofiltration Membranes with Metal Oxide ALD

Modelling of the Growth of Al₂O₃-Based Hybrid Films: Role of Terminal Groups in Aromatic Molecules

Engineering Biomimetic Biocompatible and Selectively Antibacterial Ultrathin Films by Vapor Phase Chemistry

Controlled Encapsulation of Monolayer MoS₂ with Ultrathin Aluminum Oxide for Low Resistance Tunnel Contact Formation

Synthesis of Crystalline Tungsten Disulfide Using Atomic Layer Deposition and Post-Deposition Sulfur Annealing

In-Situ-Prepared Protective Seed Layer by Plasma ALD on Graphene

Polycrystalline MoS₂ Thin Films at 100 °C by Plasma-Enhanced Atomic Layer Deposition

Selectively Decorated Pt Nanoparticle on WS₂ by Atomic Layer Deposition for High-Performance Gas Sensor

Closing Remarks and Thank Yous