ALD/ALE 2022 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, June 27, 2022
1:30 PM 2:30 PM 3:30 PM 4:30 PM 5:30 PM
AA1-MoA
ALD Preparation of TiO2-MnOx/SiO2 Catalyst for Selective Catalytic Reduction of Nitrogen Oxides
Unravelling the Mechanism of Electrochemical Activation of ALD Cobalt Phosphate by Digital Control Over Its Chemical Composition
Increasing ALD Complexity: How to Transform Ternary Oxide Films Into Tunable Bimetallic Thin Films and Nanoparticles
Tunable TiO2-BN-Pd Nanofibers by Combining Electrospinning and Atomic Layer Deposition to Enhance Photodegradation of Acetaminophen
Ultra-Low Dimensional Ir-Ru Thin-Film by Atomic Layer Deposition on Porous Titanium Felt Substrate for Electrochemical Water Splitting Application
Influence of Co/Ni Ratio on OER-catalytic Performance of Atomic Layer Deposited Nickel Cobalt Oxide
Fundamental Studies of s-ALD Grown Iridium Thin Films on Planar Substrates for Acidic Water Splitting
Functionalization of MoS2 With Noble Metal by Atomic Layer Deposition for Hydrogen Evolution Reaction
Break & Exhibits
AA2-MoA
Conversion Reactions and Redox Changes on the Surface of Lithium-Ion Battery Cathode Materials during Chemical Vapor Treatment for ALD
Titanium Carboxylate MLD Hybrid Films as Protective Coatings for Lithium-Ion Batteries
Surface Coating and Grain Boundary Engineering of NMC811 Materials for Next-Generation Li-Ion Batteries
Hybrid Inorganic/Organic Polycarbonate Track-Etched Membranes With Tunable Pore Size and Surface Functionality for Redox Flow Batteries
TiO2 ALD Thin Films Characterization for SiC Capacitor
ALD Can Enable Competitive, U.S.-Sourced Graphite Production
Plasma-Enhanced Atomic Layer Deposition of Nickel and Cobalt Phosphate for Lithium Ion Batteries
AF1-MoA
Atomic Layer Deposition of CsI and CsPbI3
Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of Structure and Thermal Properties as ALD Precursors
SnO Thin Films via Water Based ALD using a Sn(II) Precursor: Precursor Evaluation and ALD Process Development
Tuning the Texture of ZnO Thin Films Through the Addition of a Volatile Shape-Directing Agent in the AP-SALD System
Recent Advances in Rare Earth Precursors for ALD
Novel Growth Inhibitor in Atomic Layer Deposition for Conformal Coverage on High Aspect Ratio Trenches
Solution ALD: A Versatility Process for the Growth of Sulfides and Selenides
Flash-Lamp Enabled Atomic Layer Deposition
Break & Exhibits
AF2-MoA
A User Experience Feedback on Numerical Simulation for CVD/ALD Precursor Design & Development
What Is the Reactivity of a Precursor in ALD? - Simulation of Growth and Etch Rates
Random Sequential Adsorption and the Consequences for the Growth-Per-Cycle of Atomic Layer Deposition Processes
Machine Learning Based Atomistic Modeling of ALD Processes
Modelling Ruthenium Deposition in Atomic Layer Deposition of Ru-doped TaN
AF3-MoA
Revisited Thermal and Plasma Enhanced Atomic Layer Deposition Processes of Metal Nitrides
Plasma-Enhanced Low-Temperature ALD Process for Molybdenum Oxide Thin Films and Its Evaluation as Hydrogen Gas Sensors
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Crystalline Tin Disulfide Thin Films
Leveraging Non-Saturated Oxidation Conditions in Plasma-Enhanced Atomic Layer Deposition for Tuning Functional Properties of CoOx Catalyst Layers
Low-temperature HfO2/SiO2 Gate Stacked Film Grown by Neutral Beam Enhanced Atomic Layer Deposition
Break & Exhibits
AF4-MoA
Thickness Matters: Sintering Inhibition of Pt Nanoparticle Catalysts via Sequential Control of MgO Overcoats
Route to Low Temperature Area-Selective Atomic Layer Deposition of Ni
Hydrogen Plasma-Assisted Atomic Layer Deposition of sub-Nanometer AlOx for Low-Impedance Contacts to GaN
Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition Grown Amorphous TiO2
Temperature-Time-Thickness (Ttt) Topography Maps: A Parameter Space Visualization Approach for ALD Processes
in situ TEM Study to Unravel Dynamic Processes during the Synthesis of Ultrathin Crystalline ALD Nanotubes
ALE1-MoA
Chlorination and Ligand Addition for Thermal ALE of Metals
Thermal ALE of Molybdenum via Low Temperature Oxidation in Ozone and Wet Chemical Oxide Dissolution
Selective Thermal Atomic Layer Etching of CoFeB Over MgO by Sequential Exposure to Chlorine and Diketone
Ligand-Exchange and Etching Reactions between Metal Fluorides and Silane Precursors Containing Different Ligands
Thermal Atomic Layer Etching of Zinc Sulfide (ZnS) Using Sequential Al(CH3)3 and HF Exposures
Requirements Beyond Etch Per Cycle for Thermal ALE in Semiconductor Manufacturing
ALE2-MoA
Break & Exhibits
From Barrel to ALE: A Lifetime in Etch/A Material and System Design Perspective
Understanding the Self-limiting Behavior in Atomic Layer Etched HfO2
Area-Selective Atomic Layer Etching of SiO2 Using Silane Coupling Agent
Improving SiO2 toSiNx ALE Selectivity with Surface Pre-functionalization for SiO2/SiNx Stacks
Plasma-Assisted Atomic Layer Etching of Silicon Nitride with Unfragmented Fluorocarbons
Silicon Atomic Layer Etching with Surface Chlorination and Removal with Ar or He Plasma
Sessions | Time Periods | Topics | Schedule Overview