ALD/ALE 2021 Wednesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Wednesday, June 30, 2021
9:30 AM 10:30 AM 11:30 AM 12:30 PM 1:30 PM
LI-ALD-WeM1
Welcome, Thank Yous & Instructions
Another Opportunity in Area Selective Atomic Layer Deposition using Precursor Inhibitors
Direct Deposition of High-resolution 3D Nanostructures by Atomic-Layer Additive Manufacturing (ALAM)
The Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition
Diffusion-Mediated Ruthenium Area-Selective Atomic Layer Deposition in Nanopatterns
BREAK
Area-Selective CVD of Metallic Films on Oxide Substrates With Acidic or Basic Hydroxyl Groups
Inhibiting Plasma Enhanced Atomic Layer Deposition of SiO2 on Cu using Thiol Multilayers in an ABC Cycle
Sequential Area Selective Deposition of Poly(3,4-ethylenedioxythiophene) (PEDOT) and Tungsten on SiO2/Si-H Substrates
Atomic Precision Advanced Manufacturing and Lessons for Area-Selective Deposition
The Role of Precursor-Inhibitor Interactions in Area-Selective Atomic Layer Deposition
BREAK
Spatially Controlled Atomic Layer Deposition within Polymer Templates for Multi-Material Nanorods and Nanowires Fabrication
Maskless Patterned Spatial ALD for Thin-Film Encapsulation
Y2O3 Atomic Layer Deposition Process Scale-Up to Very Large Batch Size
Low Temperature Thermal Atomic Layer Deposition of Elemental Tellurium Using and a Novel Tellurium Precursor and Nitrogen-Based Coreactants
When Complex Becomes Complicated – Strategies for Succeeding with Arduous Ternary Oxide Processes
Announcement of ALD and ALE Student Awardees, Closing Remarks & Thank Yous
Sessions | Time Periods | Topics | Schedule Overview