ALD/ALE 2021 Tuesday Morning

Sessions | Time Periods | Topics | Schedule Overview

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Session Tuesday, June 29, 2021
9:30 AM 10:30 AM 11:30 AM
LI-ALE-TuM3
Welcome, Thank Yous, & Instructions
Atomic Scale Profile Control in Fine Pitch Patterning and High Aspect Ratio Contact Hole Etching
Nanoscale Cryogenic Process for Highly Selective Etch of Si3N4 Over Si
Using Selective Surface Functionalization of SiNx to Increase SiO2 to SiNx ALE Selectivity
Etch-stop Mechanisms in Plasma-assisted Atomic Layer Etching of Silicon Nitride: A Molecular Dynamics Study
BREAK
Landscape of Spontaneous Etch via Ligand-Exchange in Thermal Atomic Layer Etching
Mechanisms of Self-Limiting Processes in Thermal Atomic Layer Etching of Nickel by ‏β-diketones
Oxidation Influences Etch Quality in the Low-Temperature Thermal ALE of Copper
Thermal Atomic Layer Etching of Al2O3 and AlN Using HF or XeF2 for Fluorination and BCl3 for Ligand-Exchange
Closing Remarks & Thank Yous
Sessions | Time Periods | Topics | Schedule Overview