ALD2019 Wednesday Afternoon
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Wednesday, July 24, 2019 | |||||||
|---|---|---|---|---|---|---|---|---|
| 1:30 PM | 2:30 PM | |||||||
| AA1-WeA |
Atomic Layer Deposited Nano-Coatings to Protect SrAl2O4 Based Long-Life Phosphors from Environmental Degradation
|
Enhanced Interfacial Fracture Toughness of Polymer-Epoxy Interfaces using ALD Surface Treatments
|
Atomic Layer Deposition of Pd on ZnO Nanorods for High Performance Photocatalysts
|
Accelerating Light Beam (ALB) Generation through Dielectric Optical Device Fabricated by Low Temperature Atomic Layer Deposition (ALD)
|
Tunable Plasmonic Colours Preserved and Modified by Atomic Layer Deposition of Alumina
|
TFE of OLED Displays by Time-Space-Divided (TSD) PE-ALD and PE-CVD Hybrid System
|
Tailoring the Ferroelectricity of ZrO2 Thin Films using Ultrathin Interfacial Layers Prepared by Plasma-Enhanced Atomic Layer Deposition
|
Spin-Hall-Active Platinum Thin Films Grown Via Atomic Layer Deposition
|
| AA2-WeA |
Silicon-Based Low k Dielectric Materials with Remote Plasma ALD
|
SiOC Films by PEALD with Excellent Conformality and Wet Etch Resistance
|
ALD TiN for Superconducting Through-Silicon Vias
|
Physical and Electronic Properties of Annealed ALD-deposited Ru from Ru(DMBD)(CO)3 and Oxygen
|
Fluorine Free Boron-Containing Composite Layers for Shallow Dopant Source Applications
|
Impact of Medium Energy Ions on the Microstructure and Physical Properties of TiN Thin Layers Grown by Plasma Enhanced Atomic Layer Deposition (PE-ALD).
|
ALD Process Monitoring for 3D Device Structures
|
|
| EM1-WeA |
Rhenium(III)-based Ternary Oxides: Novel Materials from Straightforward Synthesis via ALD Comprising Uncommon Reaction Pathways
|
Growth Bbehavior and Electronic Characterization of PbZrO3 and PbZrxTi1-xO3 Grown by Atomic Layer Deposition with Several Zr Precursors
|
Understanding Growth Characteristics of ALD NiAlyOx: The Role of Ozone
|
Atomic Layer Deposition of BxMg1-xO Films: Progress Towards Shallow Boron Doping
|
Enhanced Doping Control of Metal Oxide Thin Films Using a Modified ALD Process
|
As Deposited Epitaxial LaNiO3 and La(Ni,Cu)O3 with Controllable Electric Properties
|
Time Dependence of Pyroelectric Response in Ferroelectric Hf0.58Zr0.42O2 Films
|
Tailoring Nickel Oxide Conductivity by Introducing Transition Metals: From First-principles to Experimental Demonstration
|
| NS-WeA |
Modified ALD Process to Achieve Crystalline MoS2Thin Films
|
Nucleation and Growth of ALD MoS2 Films on Dielectric Surfaces
|
Plasma-Enhanced Atomic Layer Deposition of Transition Metal Dichalcogenides: From 2D Monolayers to 3D Vertical Nanofins
|
Atomic Layer Deposition of Emerging 2D Semiconductors HfS2 and ZrS2
|
Low Temperature ALD for Phase-controlled Synthesis of 2D Transition Metal (M=Ti, Nb) di- (MX2) and Tri- (MX3) Sulfides
|
ALD Boron Nitride Coated and Infiltrated Carbon Materials for Environmental Applications
|
||