ALD2019 Tuesday Afternoon

Atomic Layer Deposition of Indium Gallium Zinc Oxide (IGZO) Semiconductor Thin Films: From Precursor to Thin Film Transistor Application

ALD Growth of Ultra-thin Co Layers on the Topological Insulator Sb₂Te₃

Modifying Interfacial Chemistry of Cellulose-Reinforced Epoxy Resin Composites using Atomic Layer Deposition (ALD)

Atomic Layer Deposition of Au Nanoparticles on Titania

Multi-layer Protective Coatings on Silver for Protection of Historic Silver Artifacts

Nonlinear Optical Properties of TiO₂-Based ALD Thin Films

Atomic Layer Deposition to Alter the Wetting and Thermal Properties of Lumber

Tunable Electrical Properties of Lithium Fluoride Thin Films using Different Fluorine Sources

The Role of Al₂O₃ ALD Precursor Chemistry on the Electrochemical Performance of Lithium Ion Battery Cathode Mmaterials

Spatial Atomic Layer Deposition of Hybrid Nanolaminates for High Capacity Li-ion Battery Electrodes

Lithium Organic Thin Films for Various Battery Components

ALD Infiltration of LiCoO₂ for High Rate Lithium Ion Batteries

ALD Al₂O₃ and MoS₂ Coated TiO₂ Nanotube Layers as Anodes for Lithium Ion Batteries

Doped Hi-K ALD Films of HfO_X and ZrO_X for Advanced Ferroelectric and Anti-Ferroelectric Memory Device Applications:

ALD of La-Doped HfO₂ Films for Ferroelectric Applications

Characterization of Multi-Domain Ferroelectric ZrO₂ Thin Films for Negative Capacitance and Inductive Responses

Scaling Ferroelectric Hf_0.5Zr_0.5O₂ on Metal-Ferroelectric-Metal (MFM) and Metal-Ferroelectric-Insulator-Semiconductor (MFIS) Structures

Interface Characteristics of MIM Capacitors using Vanadium Nitride Electrode and ALD-grown ZrO₂ High-k Dielectric Film

Low Temperature High Quality Silicon Dioxide by Neutral Beam Enhanced Atomic Layer Deposition

Radical Surface Recombination Probabilities during Plasma ALD of SiO₂, TiO₂ and Al₂O₃ Determined from Film Conformality

A Robust Method for In-situ Gas Monitoring of ALD Processes using Optical Emission Spectroscopy of a Pulsed Remote Plasma

Near Room Temperature Plasma Enhanced Atomic Layer Deposition of Gold Metal

Low-Temperature Deposition of Gallium Oxide and Aluminum Oxide with Arrays of Microcavity Plasma Enhanced Atomic Layer Deposition

The Effects of Varying Plasma Conditions on Plasma Assisted Atomic Layer Epitaxy

Plasma-Enhanced Atomic Layer Epitaxy of Ultra-wide Bandgap Ga₂O₃ and (Al_xGa_1-x)₂O₃ Films

Atomic Layer Etching of Nanostructures

Selectivity during Plasma ALE of Si-Compounds: Reaction Mechanism Studied by in-situ Surface Spectroscopy

Chamber Vacuum Strategies to Enable High Productivity ALE

Mechanistic Study of the Thermal Atomic Layer Etch of Cobalt Metal Using Propene and CO

Selective Quasi-ALE of SiO₂ over Si₃N₄ via Bottom-up Si₃N₄ Passivation: A Computational Study

Insights of Different Etching Properties between CW and ALE Processes using 3D Voxel-Slab Model

First-principles Understanding of Atomic Layer Etching of Silicon Nitride using Hydrofluorocarbons

An Extended Knudsen Diffusion Model for Aspect Ratio Dependent Atomic Layer Etching

Thermodynamics-Based Screening Approach for Atomic Layer Etching

Always in Competition: Self-limiting Versus Continuous Reactions in ALD and ALEt

Variation of Etched Depth per Cycle and Removal of Reactive Species in Atomic-Layer Etching (ALE) : Molecular Dynamics Study

Elucidating Mechanisms of Selective ALD of Al₂O₃ by a Comparative Study of Precursors

Area-Selective Atomic Layer Deposition using Dodecanethiols: Comparison of Monolayer versus Multilayer

Mechanism for Breakdown in Selectivity During Area-Selective Atomic Layer Deposition of ZrO₂ on a SiO₂ Surface Functionalized with a Blocking Layer

Area Selective Chemical Vapor Deposition of Co from the Co (CO) Precursor: Use of Ammonia to Afford Dielectric-Dielectric Selectivity

Area-Selective ALD of Silicon Oxide using Inhibitors in Four-step Cycles for Metal/Dielectric Selectivity

Selective Area Growth of Deactivating Polymers

Area-Selective ALD of ZnO Films Patterned by Electrohydrodynamic Jet Printing of Polymers with Sub-Micron Resolution

Selective Deposition of Silicon Nitride

Area-Selective Deposition and Smoothing of Ru by Combining Atomic Layer Deposition and Selective Etching

Single Batch Strategies for the Development of an Area Selective Deposition Process with the Deposition/Etch Approach

Surface Halogenation of Amorphous Carbon for Defect-free Area-Selective Deposition of Metal Oxides

Real-time Grazing Incidence Small-angle X-ray Scattering Studies of Indium Aluminum Nitride Growth

Expanding the Materials Library of Sequential Infiltration Synthesis: Conductive Indium and Gallium Oxides Grown in Polymers

Highly Efficient and Stable Organic – Inorganic Halide Perovskite Solar Cells with ALD-grown Charge Transport Layers