ALD2018 Tuesday Morning

Using ALD to Engineer Metal/Insulator/Metal Devices

Impact of Metal Nanocrystal Size and Distribution on Resistive Switching Parameters of Oxide-based Resistive Random Access Memories by Atomic Layer Deposition

Epitaxial Electronic Materials by Atomic Layer Deposition

Scaling Ferroelectric Hf_0.5Zr_0.5O₂ for Back -end of Line Integration

Atomic Layer Deposition Processes for Logic Device Applications

Effect of ZrO₂ Capping-layer on Ferroelectricity of Hf_xZr_1−xO₂ Thin Films by ALD using Hf/Zr Cocktail Precursor

Efficient Photoelectrochemical H₂ Generation using Molybdenum Disulfide Film on Black Si Photocathode via Wafer-scale Atomic Layer Deposition

Junction Interface Passivation by ALD in CIGS Solar Cells

Spatial Atomic Layer Deposition: Up-scalable Route of Metal Oxide Functional Layers for High Efficient and Stable Perovskite Solar Cells and Modules

Applications of Atomic Layer Deposition in Solar Energy Conversion

Inorganic Charge Transport Layers Grown via Atomic Layer Deposition for Highly Stable and Efficient Perovskite Solar Cell

Atomic Layer Deposition of Yttrium Oxide from Bis(Methylcyclopentadienyl) (MethylPentyl Pyrazolato) Yttrium (III)

Low-temperature Thermal ALD of SiO₂ – Increasing the Possibilities

Non-pyrophoric Aluminum Precursor for Thermal Atomic Layer Deposition of Al₂O₃ Thin Films

Study on ALD Carbide Chemistry Approach for Rhenium

Development of Advanced Precursors for Deposition of Cobalt Films

Diamine Adduct of Cobalt(II) Chloride for ALD of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Development New Metal Precursors for Atomic Layer Deposition at KRICT

Surface Chemistry during Atomic Layer Deposition of Nickel Sulfide

Exchange Reactions during Atomic Layer Deposition: ZnO Conversion to Al₂O₃ by Trimethylaluminum

Elucidation of the Mechanisms of Nickel (II) and Iron (III) Oxide Films Grown with Ozone by Atomic Layer Deposition

Reaction Mechanisms of the Atomic Layer Deposition of Indium Oxide Thin Films Using Ethylcyclopentadienyl Indium

Reaction Mechanisms of Halogenated Silanes on N-rich Surfaces during Atomic Layer Deposition of Silicon Nitride

Fluorocarbon-based Atomic Layer Etching of Silicon Dioxide in Conventional Plasma Tools

Damaged Layer Control for Atomic Level Processes

Selective Thermal Cyclic ALE of Lanthanum Oxide via Formation and Desorption of Organo-lanthanum Complex

Thermal Atomic Layer Etching of Silicon Using an Oxidation and “Conversion-Etch” Mechanism

Rapid Atomic Layer Etching of Al₂O₃ using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum with No Purging

Self-limiting Thermal Atomic Layer Etching of Tungsten Metal Using O₂ Oxidation and WCl₆ or WF₆: Role of Halogen Species in Temperature Dependence of ALE Reaction Rate

Modifying Thermal HF-based ALE Methods via Secondary Interactions with Alkali Compounds

The Role of Modelling in Understanding and Designing Processes for Thermal Atomic Layer Etch

Physical Damage Analysis of Atomic Layer Etching of Silicon using Molecular Dynamic Simulations

Dimer Products from Ligand-Exchange Reactions During Thermal Atomic Layer Etching

Molecular Dynamics Simulation of SiO₂ Atomic-layer Etching (ALE) by Fluorocarbon and Argon Plasmas

Selective Area Deposition of BN using Electron Enhanced ALD

Reactive Monolayers for use in Area Selective Atomic Layer Deposition

Area-selective Atomic Layer Deposition using Si Precursor Inhibitors

In situ and ex situ Monitoring and Metrology for the Development of a Selective Deposition Process

Area-Selective Atomic Layer Deposition of TiN, TiO₂, and HfO₂ on Si₃N₄ in Sub-50 Nanometer Si₃N₄/Amorphous Carbon Structures

Toward Area Selective ALD on Metal/Dielectric Patterns: Comparison of Cu, Co, W and Ru

Advanced Cycles for Area-selective Atomic Layer Deposition

The Precise Tailoring of Catalyst Interface by Atomic Layer Deposition

Improving the Anti-sintering Ability of Au/TiO₂ Catalysts by Constructing Semi-embedded Structure via Selective Atomic Layer Deposition

Tuning of Boron Nitride Nanotubes, Nanopores and Nanoporous Membranes by ALD